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通过开尔文探针和光电子产额光谱法研究经KF和RbF处理的样品中CdS/Cu(In,Ga)Se界面的电子结构

Electronic Structure of the CdS/Cu(In,Ga)Se Interface of KF- and RbF-Treated Samples by Kelvin Probe and Photoelectron Yield Spectroscopy.

作者信息

Rusu Marin, Kodalle Tim, Choubrac Leo, Barreau Nicolas, Kaufmann Christian A, Schlatmann Rutger, Unold Thomas

机构信息

Struktur und Dynamik von Energiematerialien, Helmholtz-Zentrum Berlin für Materialien und Energie, Lise-Meitner Campus, Hahn-Meitner-Platz 1, 14109 Berlin, Germany.

PVcomB, Helmholtz-Zentrum Berlin für Materialien und Energie, Schwarzschildstr. 3, 12489 Berlin, Germany.

出版信息

ACS Appl Mater Interfaces. 2021 Feb 17;13(6):7745-7755. doi: 10.1021/acsami.0c20976. Epub 2021 Feb 2.

DOI:10.1021/acsami.0c20976
PMID:33529003
Abstract

Ambient-pressure Kelvin probe and photoelectron yield spectroscopy methods were employed to investigate the impact of the KF and RbF postdeposition treatments (KF-PDT, RbF-PDT) on the electronic features of Cu(In,Ga)Se (CIGSe) thin films and the CdS/CIGSe interface in a CdS thickness series that has been sequentially prepared during the chemical bath deposition (CBD) process depending on the deposition time. We observe distinct features correlated to the CBD-CdS growth stages. In particular, we find that after an initial CBD etching stage, the valence band maximum (VBM) of the CIGSe surface is significantly shifted (by 180-620 mV) toward the Fermi level. However, VBM positions at the surface of the CIGSe are still much below the VBM of the CIGSe bulk. The CIGSe surface band gap is found to depend on the type of postdeposition treatment, showing values between 1.46 and 1.58 eV, characteristic for a copper-poor CIGSe surface composition. At the CdS/CIGSe interface, the lowest VBM discontinuity is observed for the RbF-PDT sample. At this interface, a thin layer with a graded band gap is found. We also find that K and Rb act as compensating acceptors in the CdS layer. Detailed energy band diagrams of the CdS/CIGSe heterostructures are proposed.

摘要

采用常压开尔文探针和光电子产额光谱方法,研究了在化学浴沉积(CBD)过程中根据沉积时间顺序制备的CdS厚度系列中,KF和RbF沉积后处理(KF-PDT、RbF-PDT)对Cu(In,Ga)Se(CIGSe)薄膜和CdS/CIGSe界面电子特性的影响。我们观察到与CBD-CdS生长阶段相关的明显特征。特别是,我们发现在初始CBD蚀刻阶段之后,CIGSe表面的价带最大值(VBM)显著向费米能级移动(移动180 - 620 mV)。然而,CIGSe表面的VBM位置仍远低于CIGSe体相的VBM。发现CIGSe表面带隙取决于沉积后处理的类型,显示出1.46至1.58 eV之间的值,这是贫铜CIGSe表面组成的特征值。在CdS/CIGSe界面处,RbF-PDT样品观察到最低的VBM不连续性。在该界面处,发现了一个具有渐变带隙的薄层。我们还发现K和Rb在CdS层中充当补偿受主。提出了CdS/CIGSe异质结构的详细能带图。

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