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LaPrNiO薄膜中的电输运性质和近藤效应。

Electrical transport properties and Kondo effect in LaPrNiO thin films.

作者信息

Hien-Hoang Van, Chung Nak-Kwan, Kim Heon-Jung

机构信息

Department of Physics, Graduate School, Daegu University, Gyeongsan, Gyeongbuk, 38453, Republic of Korea.

Research Team of Material Compatibility To Hydrogen Facility, Korea Research Institute of Standards and Science (KRISS), Daejeon, 34113, Republic of Korea.

出版信息

Sci Rep. 2021 Mar 8;11(1):5391. doi: 10.1038/s41598-021-84736-2.

Abstract

The Kondo effect has been a topic of intense study because of its significant contribution to the development of theories and understanding of strongly correlated electron systems. In this work, we show that the Kondo effect is at work in LaPrNiO (0 ≤ x ≤ 0.6) thin films. At low temperatures, the local magnetic moments of the 3d e electrons in Ni, which form because of oxygen vacancies, interact strongly with itinerant electrons, giving rise to an upturn in resistivity with x ≥ 0.2. Observation of negative magnetoresistance, described by the Khosla and Fisher model, further supports the Kondo picture. This case represents a rare example of the Kondo effect, where Ni acts as an impurity in the background of Ni. We suggest that when Ni does not participate in the regular lattice, it provides the local magnetic moments needed to scatter the conduction electrons in the Kondo effect. These results offer insights into emergent transport behaviors in metallic nickelates with mixed Ni and Ni ions, as well as structural disorder.

摘要

近藤效应因其对强关联电子系统理论发展和理解的重大贡献,一直是深入研究的课题。在这项工作中,我们表明近藤效应在LaPrNiO(0≤x≤0.6)薄膜中起作用。在低温下,由于氧空位而形成的Ni中3d e电子的局域磁矩与巡游电子强烈相互作用,导致x≥0.2时电阻率出现上升。由Khosla和Fisher模型描述的负磁阻的观测,进一步支持了近藤图像。这种情况代表了近藤效应的一个罕见例子,其中Ni在Ni背景中充当杂质。我们认为,当Ni不参与规则晶格时,它提供了在近藤效应中散射传导电子所需的局域磁矩。这些结果为具有混合Ni和Ni离子以及结构无序的金属镍酸盐中的新兴输运行为提供了见解。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/07ee/7940496/f20c9e740171/41598_2021_84736_Fig1_HTML.jpg

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