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利用ENZ超材料在双光子直接激光写入中实现二维和三维超分辨率

Leveraging on ENZ Metamaterials to Achieve 2D and 3D Hyper-Resolution in Two-Photon Direct Laser Writing.

作者信息

Lio Giuseppe Emanuele, Ferraro Antonio, Ritacco Tiziana, Aceti Dante Maria, De Luca Antonio, Giocondo Michele, Caputo Roberto

机构信息

Institute of Nanotechnology - Nanotec, Consiglio Nazionale delle Ricerche, Ponte P. Bucci - Cubo 33C, Rende, 87036, Italy.

University of Calabria, Physics Department, 87036 Arcavacata di Rende (CS), Italy.

出版信息

Adv Mater. 2021 May;33(18):e2008644. doi: 10.1002/adma.202008644. Epub 2021 Mar 30.

DOI:10.1002/adma.202008644
PMID:33783047
Abstract

A novel technique is developed to improve the resolution of two-photon direct laser writing lithography. Thanks to the high collimation enabled by extraordinary ε (near-zero) metamaterial features, ultrathin dielectric hyper-resolute nanostructures are within reach. With respect to the standard direct laser writing approach, a size reduction of 89% and 50%, in height and width respectively, is achieved with the height of the structures adjustable between 5 and 50 nm. The retrieved 2D fabrication parameters are exploited for realizing extremely thin all-dielectric metalenses tailored through deep machine learning codes. The hyper-resolution achieved in the writing process enables the fabrication of a highly detailed dielectric 3D bas-relief (with full height of 500 nm) of Da Vinci's "Lady with an Ermine". The proof-of-concept results show intriguing cues for the current and trendsetting research scenario in anti-counterfeiting applications and ultracompact photonics, paving the way for the realization of all-dielectric and apochromatic ultrathin imaging systems.

摘要

一种新的技术被开发出来以提高双光子直接激光写入光刻的分辨率。得益于由特殊的ε(近零)超材料特性实现的高准直度,超薄电介质超分辨纳米结构触手可及。相对于标准的直接激光写入方法,高度和宽度分别减小了89%和50%,结构高度可在5到50纳米之间调整。所获得的二维制造参数被用于通过深度机器学习代码实现定制的极薄全电介质超透镜。写入过程中实现的超分辨率使得能够制造出达·芬奇的《抱银鼠的女子》的高度精细的电介质三维浅浮雕(全高500纳米)。概念验证结果为防伪应用和超紧凑型光子学领域当前的前沿研究场景提供了有趣的线索,为实现全电介质和复消色差超薄成像系统铺平了道路。

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