Korea University of Science & Technology, 217 Gajung-ro Yuseong-gu, Daejeon, 305-333, Republic of Korea; Korea Institute of Civil Engineering and Building Technology, 283 Goyangdar-Ro, Ilsan-Gu, Goyang-Si, Gyeonggi-Do, 411-712, Republic of Korea.
Korea Institute of Civil Engineering and Building Technology, 283 Goyangdar-Ro, Ilsan-Gu, Goyang-Si, Gyeonggi-Do, 411-712, Republic of Korea.
Chemosphere. 2021 Sep;279:130513. doi: 10.1016/j.chemosphere.2021.130513. Epub 2021 Apr 12.
2-Isopropyl-3-methoxypyrazine (IPMP), 2-Isobutyl-3-methoxypyrazine (IBMP), and 2,4,6-Trichloroanisole (TCA) are the primary emerging taste and odor (T&O) compounds in water systems with low thresholds (ng L). The selected T&O compounds are known to be difficult to remove using conventional water treatment processes. In this study, we compared the removal characteristics of the three T&O compounds using UV/Cl and UV/HO. The removal rates of the three compounds by direct photolysis at 254 nm were less than 10%, even at a high UV dose (approximately 1000 mJ cm). Under conditions of an oxidant injection volume of 5 mg L and UV dose of 1000 mJ cm, the degradation rate of the target compounds in the UV/HO process exceeded that of the UV/Cl process. Moreover, the results revealed that pH has a significant impact on the removal of the T&O compounds during the UV/Cl process. The IPMP, IBMP, and TCA were found to be more reactive with hydroxyl radicals than reactive chlorine species (RCS). A predictive tool was developed to determine the optimal operating condition using the generalized reduced gradient (GRG) nonlinear solver. In the UV/HO process, the EED value for 90% removing rate was 0.156 kWh m for the IPMP, 0.135 kWh m for the IBMP, and 0.154 kWh m for the TCA, respectively. In case of the UV/Cl, the EED value for 50% removing rate was 0.174 kWh m for the IPMP, 0.138 kWh m for the IBMP, and 0.169 kWh m for the TCA, respectively.
2-异丙基-3-甲氧基吡嗪（IPMP）、2-异丁基-3-甲氧基吡嗪（IBMP）和 2,4,6-三氯苯甲醚（TCA）是水中具有低阈值（ng/L）的主要新兴味道和气味（T&O）化合物。已知这些选定的 T&O 化合物很难通过常规水处理工艺去除。在这项研究中，我们比较了使用 UV/Cl 和 UV/HO 去除这三种 T&O 化合物的特性。在 254nm 下直接光解时，三种化合物的去除率均低于 10%，即使在高 UV 剂量（约 1000mJ/cm）下也是如此。在氧化剂注入量为 5mg/L 和 UV 剂量为 1000mJ/cm 的条件下，目标化合物在 UV/HO 过程中的降解速率超过了 UV/Cl 过程。此外，结果表明 pH 值对 UV/Cl 过程中 T&O 化合物的去除有重大影响。发现 IPMP、IBMP 和 TCA 与羟基自由基的反应比与活性氯（RCS）的反应更活跃。开发了一个预测工具，使用广义简约梯度（GRG）非线性求解器确定最佳操作条件。在 UV/HO 过程中，IPMP、IBMP 和 TCA 的 90%去除率的 EED 值分别为 0.156kWh/m、0.135kWh/m 和 0.154kWh/m。在 UV/Cl 过程中，IPMP、IBMP 和 TCA 的 50%去除率的 EED 值分别为 0.174kWh/m、0.138kWh/m 和 0.169kWh/m。
