Shahid Muhid, Sanxaridou Georgia, Ottoboni Sara, Lue Leo, Price Chris
EPSRC Continuous Manufacturing & Advanced Crystallisation (CMAC) Future Manufacturing Research Hub, University of Strathclyde, Glasgow G1 1RD, U.K.
Department of Chemical and Process Engineering, University of Strathclyde, Glasgow G1 1XJ, U.K.
Org Process Res Dev. 2021 Apr 16;25(4):969-981. doi: 10.1021/acs.oprd.1c00005. Epub 2021 Mar 12.
Washing is a key step in pharmaceutical isolation to remove the unwanted crystallization solvent (mother liquor) from the active pharmaceutical ingredient (API) filter cake. This study looks at strategies for optimal wash solvent selection, which minimizes the dissolution of API product crystals while preventing the precipitation of product or impurities. Selection of wash solvents to avoid both these phenomena can be challenging but is essential to maintain the yield, purity, and particle characteristics throughout the isolation process. An anti-solvent screening methodology has been developed to quantitatively evaluate the propensity for precipitation of APIs and their impurities of synthesis during washing. This is illustrated using paracetamol (PCM) and two typical impurities of synthesis during the washing process. The solubility of PCM in different binary wash solutions was measured to provide a basis for wash solvent selection. A map of wash solution composition boundaries for precipitation for the systems investigated was developed to depict where anti-solvent phenomena will take place. For some crystallization and wash solvent combinations investigated, as much as 90% of the dissolved PCM and over 10% of impurities present in the PCM saturated mother liquor were found to precipitate out. Such levels of uncontrolled crystallization during washing in a pharmaceutical isolation process can have a drastic effect on the final product purity. Precipitation of both the product and impurities from the mother liquor can be avoided by using a solvent in which the API has a solubility similar to that in the mother liquor; for example, the use of acetonitrile as a wash solvent does not result in precipitation of either the PCM API or its impurities. However, the high solubility of PCM in acetonitrile would result in noticeable dissolution of API during washing and would lead to agglomeration during the subsequent drying step. Contrarily, the use of -heptane as a wash solvent for a PCM crystal slurry resulted in the highest amount of precipitation among the solvent pairs evaluated. This can be mitigated by designing a multi-stage washing strategy where wash solutions of differing wash solvent concentrations are used to minimize step changes in solubility when the mother liquor and the wash solvent come into contact.
洗涤是药物分离过程中的关键步骤,目的是从活性药物成分(API)滤饼中去除不需要的结晶溶剂(母液)。本研究着眼于优化洗涤溶剂选择的策略,该策略可最大程度减少API产品晶体的溶解,同时防止产品或杂质沉淀。选择能避免这两种现象的洗涤溶剂具有挑战性,但对于在整个分离过程中保持产率、纯度和颗粒特性至关重要。已开发出一种抗溶剂筛选方法,用于定量评估洗涤过程中API及其合成杂质的沉淀倾向。以对乙酰氨基酚(PCM)及其在洗涤过程中的两种典型合成杂质为例进行说明。测量了PCM在不同二元洗涤溶液中的溶解度,为洗涤溶剂的选择提供依据。绘制了所研究体系的洗涤溶液组成沉淀边界图,以描述抗溶剂现象将发生的位置。对于所研究的一些结晶和洗涤溶剂组合,发现PCM饱和母液中高达90%的溶解PCM和超过10%的杂质会沉淀出来。在药物分离过程中,洗涤过程中如此程度的不受控制的结晶会对最终产品纯度产生巨大影响。通过使用一种API在其中的溶解度与在母液中相似的溶剂,可以避免产品和杂质从母液中沉淀出来;例如,使用乙腈作为洗涤溶剂不会导致PCM API或其杂质沉淀。然而,PCM在乙腈中的高溶解度会导致洗涤过程中API明显溶解,并在随后的干燥步骤中导致团聚。相反,将庚烷用作PCM晶体浆液的洗涤溶剂,在所评估的溶剂对中沉淀量最高。这可以通过设计多阶段洗涤策略来缓解,即使用不同洗涤溶剂浓度的洗涤溶液,以尽量减少母液与洗涤溶剂接触时溶解度的阶跃变化。