Stricher Arthur, Rinaldi Renaud G, Chazeau Laurent, Ganachaud François
Ingénierie des Matériaux Polymères, CNRS UMR 5223, Insa-Lyon, Univ Lyon, F-69621 Villeurbanne, France.
MATEIS, CNRS UMR 5521, INSA-Lyon, Univ Lyon, F-69621 Villeurbanne, France.
Materials (Basel). 2021 Apr 17;14(8):2027. doi: 10.3390/ma14082027.
Direct photopatterning of PDMS (Polydimethylsiloxane) through benzophenone photo-inhibition has received great interest in recent years. Indeed, the simplicity and versatility of this technique allows for easy processing of micro-canals, or local control of PDMS mechanical properties. Surprisingly, however, the chemical reactions between silicone hydride and/or silicone vinyl groups and benzophenone have only been assessed through qualitative methods (e.g., Attenuated total reflection fourier transform infrared). In this communication, the previously proposed reaction pathways are challenged, using nuclear magnetic resonance (NMR) spectroscopy and size exclusion chromatography (SEC) monitoring. A different mechanism depicting the role of benzophenone irradiation on the polyaddition reaction of silicone formulations is proposed, and a simplified procedure involving aromatic solvent is finally disclosed.
近年来，通过二苯甲酮光抑制对聚二甲基硅氧烷（PDMS）进行直接光图案化受到了广泛关注。事实上，该技术的简单性和通用性使得微通道的加工变得容易，或者能够对PDMS的机械性能进行局部控制。然而，令人惊讶的是，硅氢化和/或硅乙烯基与二苯甲酮之间的化学反应仅通过定性方法（如衰减全反射傅里叶变换红外光谱）进行了评估。在本通讯中，利用核磁共振（NMR）光谱和尺寸排阻色谱（SEC）监测，对先前提出的反应途径提出了质疑。提出了一种不同的机制来描述二苯甲酮辐照对有机硅配方加成聚合反应的作用，最终公开了一种涉及芳烃溶剂的简化程序。
