Li Yucheng, Enomoto Jun, Hirata Yuki, Akasaka Hiroki, Ohtake Naoto
Department of Mechanical Engineering, Tokyo Institute of Technology, 2-12-1, O-okayama, Meguro-ku, Tokyo 152-8550, Japan.
Institute of Innovative Research (IIR), Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama, Kanagawa 226-8503, Japan.
Materials (Basel). 2021 Apr 29;14(9):2300. doi: 10.3390/ma14092300.
Diamond-like carbon (DLC) films have attracted considerable interest for application as protective films in diverse industrial parts. This is attributed to their desirable characteristics, such as high hardness, low coefficient of friction, gas-barrier properties, and corrosion resistance. Antiseizure properties, in addition to wear resistance, are required during the die molding of polymer and polymer-matrix composite parts. Graphite films can be easily peeled because the vertically stacked graphene sheets are bonded via weak van der Waals forces. The present study demonstrates the fabrication of multilayered DLC/Cu films, where the Cu film functions as a catalyst for the formation of a graphite-like layer between the DLC and Cu films. The DLC/Cu film was synthesized on a Si (100) substrate via plasma-enhanced chemical vapor deposition and magnetron sputtering. The peelability, wear resistance, microstructure, texture, and cross-section of the film were experimentally analyzed. The results indicated a variation in the peelability with the deposition conditions of the Cu film that comprised particles with diameters of several nanometers. The DLC film at the interface in contact with the Cu film was transformed into a graphite-like state i.e., graphitized. The surface of the multilayered film exhibited antiseizure properties with the peeling of the upper DLC film. The multilayered film also exhibited wear resistance owing to the repeated appearances of a new DLC film. It is expected that the wear-resistant films with antiseizure properties demonstrated in the present study will be utilized in various industrial sectors.
类金刚石碳（DLC）薄膜作为各种工业部件的保护膜已引起了广泛关注。这归因于它们具有诸如高硬度、低摩擦系数、气体阻隔性能和耐腐蚀性等理想特性。在聚合物和聚合物基复合材料部件的模塑成型过程中，除了耐磨性外，还需要防咬合性能。石墨薄膜很容易剥离，因为垂直堆叠的石墨烯片通过弱范德华力结合在一起。本研究展示了多层DLC/Cu薄膜的制备，其中Cu薄膜作为在DLC和Cu薄膜之间形成类石墨层的催化剂。通过等离子体增强化学气相沉积和磁控溅射在Si（100）衬底上合成了DLC/Cu薄膜。对薄膜的可剥离性、耐磨性、微观结构、织构和横截面进行了实验分析。结果表明，可剥离性随由直径为几纳米的颗粒组成的Cu薄膜的沉积条件而变化。与Cu薄膜接触的界面处的DLC薄膜转变为类石墨状态，即石墨化。随着上层DLC薄膜的剥离，多层薄膜的表面表现出防咬合性能。由于新的DLC薄膜反复出现，多层薄膜也表现出耐磨性。预计本研究中展示的具有防咬合性能的耐磨薄膜将用于各个工业领域。
