Wang Chih-Feng, Chiou Shih-Feng, Ko Fu-Hsiang, Chen Jem-Kun, Chou Cheng-Tung, Huang Chih-Feng, Kuo Shiao-Wei, Chang Feng-Chih
Department of Materials Science and Engineering, I-Shou University, 84008 Kaohsiung, Taiwan.
Langmuir. 2007 May 22;23(11):5868-71. doi: 10.1021/la062921e. Epub 2007 Apr 26.
One of the most important tasks remaining to be resolved in nanoimprint lithography is the elimination of the resist sticking to the mold during demolding. Previously, the main approach was to apply a thin layer of fluorinated alkyl silane mold-release agent on the surface on the mold; however, this involves complicated steps and high costs. The low surface free energy material polybenzoxazine provides an efficient mold-release agent for silicon molds that is easier to process, costs less, and has no side reactions.
纳米压印光刻中有待解决的最重要任务之一是在脱模过程中消除抗蚀剂粘附在模具上的问题。以前，主要方法是在模具表面涂覆一层薄薄的氟化烷基硅烷脱模剂；然而，这涉及复杂的步骤和高昂的成本。低表面自由能材料聚苯并恶嗪为硅模具提供了一种高效的脱模剂，其加工更容易、成本更低且无副反应。
