Tognazzi Andrea, Okhlopkov Kirill I, Zilli Attilio, Rocco Davide, Fagiani Luca, Mafakheri Erfan, Bollani Monica, Finazzi Marco, Celebrano Michele, Shcherbakov Maxim R, Fedyanin Andrey A, De Angelis Costantino
Opt Express. 2021 Apr 12;29(8):11605-11612. doi: 10.1364/OE.419829.
Nonlinear metasurfaces have become prominent tools for controlling and engineering light at the nanoscale. Usually, the polarization of the total generated third harmonic is studied. However, diffraction orders may present different polarizations. Here, we design an high quality factor silicon metasurface for third harmonic generation and perform back focal plane imaging of the diffraction orders, which present a rich variety of polarization states. Our results demonstrate the possibility of tailoring the polarization of the generated nonlinear diffraction orders paving the way to a higher degree of wavefront control.
非线性超表面已成为在纳米尺度上控制和操纵光的重要工具。通常，人们研究的是所产生的总三次谐波的偏振。然而，不同的衍射级可能呈现不同的偏振。在此，我们设计了一种用于三次谐波产生的高品质因子硅超表面，并对呈现出丰富多样偏振态的衍射级进行后焦平面成像。我们的结果证明了定制所产生的非线性衍射级偏振的可能性，为实现更高程度的波前控制铺平了道路。
