Shiloh R, Chlouba T, Yousefi P, Hommelhoff P
Opt Express. 2021 May 10;29(10):14403-14411. doi: 10.1364/OE.420235.
In dielectric laser acceleration, nanostructures etched into silicon are used to convert free-space ultrashort laser pulses, incident from the side and parallel to the wafer substrate, to accelerate particles. This current approach is experimentally challenging and, as it turns out, not quite necessary for most experiments and practical applications. Here, we experimentally demonstrate and numerically verify the efficacy of top-illuminated structures, and measure a maximum acceleration gradient of 49.2 ± 3.1 MeV/m. We discuss how, in practice, this approach proves superior to the current standard in the field, and expect it to become the definitive choice for nanophotonic particle laser acceleration.
在介电激光加速中，蚀刻在硅中的纳米结构用于将从侧面入射且平行于晶圆衬底的自由空间超短激光脉冲转换为加速粒子。目前的这种方法在实验上具有挑战性，而且事实证明，对于大多数实验和实际应用来说并非完全必要。在此，我们通过实验证明并通过数值验证了顶部照明结构的有效性，并测量到最大加速梯度为49.2±3.1兆电子伏特/米。我们讨论了在实际中这种方法如何证明优于该领域目前的标准，并预计它将成为纳米光子粒子激光加速的最终选择。
