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通过成像双层石墨烯莫尔图案评估近场浸润微波显微镜的极限。

The limits of near field immersion microwave microscopy evaluated by imaging bilayer graphene moiré patterns.

机构信息

Microscopy Center, Universidade Federal de Minas Gerais, Belo Horizonte, MG, Brazil.

Electrical Engineering Graduate Program, Universidade Federal de Minas Gerais, Belo Horizonte, MG, Brasil.

出版信息

Nat Commun. 2021 May 20;12(1):2980. doi: 10.1038/s41467-021-23253-2.

Abstract

Near field scanning Microwave Impedance Microscopy can resolve structures as small as 1 nm using radiation with wavelengths of 0.1 m. Combining liquid immersion microscopy concepts with exquisite force control exerted on nanoscale water menisci, concentration of electromagnetic fields in nanometer-size regions was achieved. As a test material we use twisted bilayer graphene, because it provides a sample where the modulation of the moiré superstructure pattern can be systematically tuned from Ångstroms up to tens of nanometers. Here we demonstrate that a probe-to-pattern resolution of 10 can be obtained by analyzing and adjusting the tip-sample distance influence on the dynamics of water meniscus formation and stability.

摘要

近场扫描微波阻抗显微镜可以使用波长为 0.1 米的辐射解析小至 1nm 的结构。通过将液体浸镜显微镜的概念与纳米级水弯月面的精密力控制相结合,实现了纳米级区域电磁场的聚焦。作为测试材料,我们使用扭曲双层石墨烯,因为它提供了一个样品,其中可以从埃到数十纳米的范围内系统地调节莫尔超结构图案的调制。在这里,我们通过分析和调整尖端-样品距离对水弯月面形成和稳定性的影响,证明可以获得 10nm 的探针-图案分辨率。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/9493/8170674/4b613f057da7/41467_2021_23253_Fig1_HTML.jpg

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