Mörsdorf Jean-Marc, Wadepohl Hubert, Ballmann Joachim
Anorganisch-Chemisches Institut, Universität Heidelberg, Im Neuenheimer Feld 270, D-69120 Heidelberg, Germany.
Inorg Chem. 2021 Jul 5;60(13):9785-9795. doi: 10.1021/acs.inorgchem.1c01075. Epub 2021 Jun 10.
One of the most attractive routes for the preparation of reactive tantalum(III) species relies on the efficient salt-free hydrogenolysis of tantalum(V) alkyls or tantalum(V) alkylidenes, a process known as reductive hydrogenation. For silica-crafted tantalum alkyls and alkylidenes, this process necessarily proceeds at well-separated tantalum centers, while related reductive hydrogenations in homogeneous solution commonly involve dimeric complexes. Herein, an NHC scaffold was coordinated to a novel tri(alkoxido)tantalum(V) alkylidene to circumvent the formation of dimers during reductive hydrogenation. Employing this new model system, a key intermediate of the process, namely a hydrido-tantalum alkyl, was isolated for the first time and shown to exhibit a bidirectional reactivity. Upon being heated, the latter complex was found to undergo either an α-elimination or a reductive alkane elimination. In the (overall unproductive) α-elimination step, H and the parent alkylidene were regenerated, while the sought-after transient d-configured tantalum(III) derivative was produced along the reaction coordinate of the reductive alkane elimination. The reactive low-valence metal center was found to rapidly attack one of the NHC substituents via an oxidative C-H activation, which led to the formation of a cyclometalated tantalum(V) hydride. The proposed elemental steps are in line with kinetic data, deuterium labeling experiments, and density functional theory (DFT) modeling studies. DFT calculations also indicated that the = 0 spin ground state of the Ta(III) center plays a crucial role in the cyclometalation reaction. The cyclometalated Ta(V) hydride was further investigated and reacted with several alkenes and alkynes. In addition to a rich insertion and isomerization chemistry, these studies also revealed that the former hydride may undergo a formal cycloreversion and thus serve as a tantalum(III) synthon, although the original tantalum(III) intermediate is not involved in this process. The latter reactivity was observed upon reaction with internal alkynes and led to the corresponding η-alkyne derivatives via vinyl intermediates, which rearrange via a remarkable, hitherto unprecedented, hydrogen shift reaction.
制备活性钽(III)物种最具吸引力的途径之一依赖于钽(V)烷基化合物或钽(V)亚烷基化合物的高效无盐氢解,这一过程称为还原氢化。对于二氧化硅修饰的钽烷基化合物和亚烷基化合物,该过程必然在彼此分离的钽中心进行,而均相溶液中的相关还原氢化通常涉及二聚体配合物。在此,一种N-杂环卡宾支架与一种新型的三(烷氧基)钽(V)亚烷基化合物配位,以避免还原氢化过程中形成二聚体。利用这个新的模型体系,首次分离出了该过程的关键中间体,即氢化钽烷基化合物,并表明其具有双向反应性。加热后,发现后一种配合物会发生α-消除或还原烷烃消除反应。在(总体上无生产性的)α-消除步骤中,氢和母体亚烷基被再生,而在还原烷烃消除反应的反应坐标上生成了所需的瞬态d构型钽(III)衍生物。发现活性低价金属中心通过氧化C-H活化迅速攻击N-杂环卡宾取代基之一,从而导致形成环金属化钽(V)氢化物。提出的基本步骤与动力学数据、氘标记实验和密度泛函理论(DFT)建模研究一致。DFT计算还表明,Ta(III)中心的S = 0自旋基态在环金属化反应中起关键作用。对环金属化钽(V)氢化物进行了进一步研究,并使其与几种烯烃和炔烃反应。除了丰富的插入和异构化化学性质外,这些研究还表明,前一种氢化物可能会发生形式上的环反转,从而用作钽(III)合成子,尽管原始的钽(III)中间体不参与此过程。与内炔反应时观察到后一种反应性,并通过乙烯基中间体生成相应的η-炔衍生物,该中间体通过一种显著的、前所未有的氢迁移反应进行重排。