Sherman Jeffrey D, Elloian Jeffrey, Jadwiszczak Jakub, Shepard Kenneth L
Department of Electrical Engineering, Columbia University, 500 W 120th St., New York, New York 10027, United States.
Department of Biomedical Engineering, Columbia University, 1210 Amsterdam Avenue, New York, New York 10027, United States.
ACS Appl Polym Mater. 2020 Nov 13;2(11):5110-5120. doi: 10.1021/acsapm.0c00902. Epub 2020 Aug 27.
There is growing interest in integrating piezoelectric materials with complementary metal-oxide-semiconductor (CMOS) technology to enable expanded applications. A promising material for ultrasound transducer applications is polyvinylidene fluoride (PVDF), a piezoelectric polymer. One of the challenges with PVDF is that its piezoelectric properties can deteriorate when exposed to temperatures in excess of 70 °C for extended periods of time during fabrication. Here, we report on the effects of both shortening annealing times and providing this heating non-uniformly, as is characteristic of some processing conditions, on the piezoelectric coefficient ( ) of PVDF films for various thicknesses. In this case, no degradation in the was observed at temperatures below 100 °C for anneal times of under one minute when this heating is applied through one side of the film, making PVDF compatible with many bonding and photolithographic processing steps required for CMOS integration. More surprisingly, for one-sided heating to temperatures between 90 °C and 110 °C, we observed a transient enhancement of the by nearly 40% that lasted for several hours after these anneals. We attribute this effect to induced strain in these films.
将压电材料与互补金属氧化物半导体(CMOS)技术相结合以实现更广泛应用的兴趣与日俱增。聚偏二氟乙烯(PVDF),一种压电聚合物,是用于超声换能器应用的一种很有前景的材料。PVDF面临的挑战之一是,在制造过程中,如果长时间暴露在超过70°C的温度下,其压电性能会变差。在此,我们报告了缩短退火时间以及像某些加工条件那样提供不均匀加热对不同厚度PVDF薄膜的压电系数( )的影响。在这种情况下,当通过薄膜一侧进行加热时,对于退火时间在一分钟以内且温度低于100°C的情况,未观察到压电系数的下降,这使得PVDF能够与CMOS集成所需的许多键合和光刻工艺步骤兼容。更令人惊讶的是,对于单侧加热至90°C至110°C之间的温度,我们观察到在这些退火之后,压电系数会瞬间增强近40%,并持续数小时。我们将这种效应归因于这些薄膜中产生的应变。