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用飞秒脉冲的太赫兹脉冲串对硅进行激光烧蚀。

Laser ablation of silicon with THz bursts of femtosecond pulses.

作者信息

Gaudiuso Caterina, Terekhin Pavel N, Volpe Annalisa, Nolte Stefan, Rethfeld Bärbel, Ancona Antonio

机构信息

Department of Physics, University of Bari "Aldo Moro", 70126, Bari, Italy.

CNR-IFN UOS BARI, Via Amendola 173, Bari, Italy.

出版信息

Sci Rep. 2021 Jun 25;11(1):13321. doi: 10.1038/s41598-021-92645-7.

Abstract

In this work, we performed an experimental investigation supported by a theoretical analysis, to improve knowledge on the laser ablation of silicon with THz bursts of femtosecond laser pulses. Laser ablated craters have been created using 200 fs pulses at a wavelength of 1030 nm on silicon samples systematically varying the burst features and comparing to the normal pulse mode (NPM). Using bursts in general allowed reducing the thermal load to the material, however, at the expense of the ablation rate. The higher the number of pulses in the bursts and the lower the intra-burst frequency, the lower is the specific ablation rate. However, bursts at 2 THz led to a higher specific ablation rate compared to NPM, in a narrow window of parameters. Theoretical investigations based on the numerical solution of the density-dependent two temperature model revealed that lower lattice temperatures are reached with more pulses and lower intra-burst frequencies, thus supporting the experimental evidence of the lower thermal load in burst mode (BM). This is ascribed to the weaker transient drop of reflectivity, which suggests that with bursts less energy is transferred from the laser to the material. This also explains the trends of the specific ablation rates. Moreover, we found that two-photon absorption plays a fundamental role during BM processing in the THz frequency range.

摘要

在这项工作中,我们进行了一项实验研究,并辅以理论分析,以增进对飞秒激光脉冲太赫兹脉冲串激光烧蚀硅的认识。我们使用波长为1030nm的200飞秒脉冲,在硅样品上创建了激光烧蚀坑,系统地改变脉冲串特征,并与正常脉冲模式(NPM)进行比较。一般来说,使用脉冲串可以降低材料的热负荷,然而,这是以牺牲烧蚀速率为代价的。脉冲串中的脉冲数越多,脉冲串内频率越低,比烧蚀速率就越低。然而,在一个狭窄的参数窗口内,2太赫兹的脉冲串比正常脉冲模式具有更高的比烧蚀速率。基于密度依赖双温度模型数值解的理论研究表明,脉冲数越多、脉冲串内频率越低时,晶格温度越低,从而支持了脉冲串模式(BM)热负荷较低的实验证据。这归因于反射率的瞬态下降较弱,这表明在脉冲串模式下,从激光传递到材料的能量较少。这也解释了比烧蚀速率的趋势。此外,我们发现双光子吸收在太赫兹频率范围内的脉冲串模式加工过程中起着重要作用。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ab82/8233330/9d5d7f0fc38a/41598_2021_92645_Fig1_HTML.jpg

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