Kozuma Tomoya, Mihata Aki, Kaneko Yoshiro
Graduate School of Science and Engineering, Kagoshima University, Kagoshima 890-0065, Japan.
Materials (Basel). 2021 Jun 9;14(12):3178. doi: 10.3390/ma14123178.
In this study, we prepared a polyhedral oligomeric silsesquioxane (POSS)-linking polyamide (POSS polyamide) by a polycondensation of ammonium-functionalized POSS (POSS-A) and carboxyl-functionalized POSS (POSS-C) in dehydrated dimethyl sulfoxide (DMSO) using 1-(3-dimethylaminopropyl)-3-ethylcarbodiimide hydrochloride (EDC) and -hydroxysuccinimide (NHS) as condensing agents. The obtained POSS polyamide was soluble in various highly polar solvents, and it could form a self-standing film. FT-IR, H NMR, and Si NMR analyses showed that POSS polyamide is a polymer in which POSS-A and POSS-C are linked almost linearly by amide bonds. Furthermore, the cast film obtained by heat-treating the polymer at 150 °C for 30 min exhibited excellent transparency and hard-coating (pencil scratch test: 5H) and antifogging properties (evaluation by water vapor exposure).
在本研究中,我们以1-(3-二甲基氨基丙基)-3-乙基碳二亚胺盐酸盐(EDC)和N-羟基琥珀酰亚胺(NHS)作为缩合剂,在脱水二甲基亚砜(DMSO)中,通过铵官能化倍半硅氧烷(POSS-A)与羧基官能化倍半硅氧烷(POSS-C)的缩聚反应制备了一种多面体低聚倍半硅氧烷(POSS)连接的聚酰胺(POSS聚酰胺)。所制备的POSS聚酰胺可溶于多种高极性溶剂,并且能够形成自支撑膜。傅里叶变换红外光谱(FT-IR)、氢核磁共振(¹H NMR)和硅核磁共振(²⁹Si NMR)分析表明,POSS聚酰胺是一种聚合物,其中POSS-A和POSS-C通过酰胺键几乎呈线性连接。此外,将该聚合物在150℃下热处理30分钟得到的流延膜表现出优异的透明度、硬涂层性能(铅笔划痕试验:5H)和防雾性能(通过水蒸气暴露进行评估)。