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可扩展的无序超均匀结构 金属氧化物的纳米压印光刻

Scalable Disordered Hyperuniform Architectures Nanoimprint Lithography of Metal Oxides.

作者信息

Chehadi Zeinab, Bouabdellaoui Mohammed, Modaresialam Mehrnaz, Bottein Thomas, Salvalaglio Marco, Bollani Monica, Grosso David, Abbarchi Marco

机构信息

Aix Marseille Univ, Université de Toulon, CNRS, IM2NP, Marseille, France.

Institute of Scientific Computing, TU Dresden, 01062 Dresden, Germany.

出版信息

ACS Appl Mater Interfaces. 2021 Aug 11;13(31):37761-37774. doi: 10.1021/acsami.1c05779. Epub 2021 Jul 29.

Abstract

Fabrication and scaling of disordered hyperuniform materials remain hampered by the difficulties in controlling the spontaneous phenomena leading to this novel kind of exotic arrangement of objects. Here, we demonstrate a hybrid top-down/bottom-up approach based on sol-gel dip-coating and nanoimprint lithography for the faithful reproduction of disordered hyperuniform metasurfaces in metal oxides. Nano- to microstructures made of silica and titania can be directly printed over several cm on glass and on silicon substrates. First, we describe the polymer mold fabrication starting from a hard master obtained spontaneous solid-state dewetting of SiGe and Ge thin layers on SiO. Then, we assess the effective disordered hyperuniform character of master and replica and the role of the thickness of the sol-gel layer on the metal oxide replicas and on the presence of a residual layer underneath. Finally, as a potential application, we show the antireflective character of titania structures on silicon. Our results are relevant for the realistic implementation over large scales of disordered hyperuniform nano- and microarchitectures made of metal oxides, thus opening their exploitation in the framework of wet chemical assembly.

摘要

无序超均匀材料的制造和规模化仍受到阻碍,因为难以控制导致这种新型奇特物体排列的自发现象。在此,我们展示了一种基于溶胶 - 凝胶浸涂和纳米压印光刻的混合自上而下/自下而上的方法,用于在金属氧化物中忠实地复制无序超均匀超表面。由二氧化硅和二氧化钛制成的纳米到微米结构可以直接在玻璃和硅基板上几厘米的范围内进行印刷。首先,我们描述了从通过SiGe和Ge薄层在SiO上的自发固态去湿获得的硬模板开始的聚合物模具制造。然后,我们评估了模板和复制品的有效无序超均匀特性以及溶胶 - 凝胶层厚度对金属氧化物复制品和下面残留层存在的作用。最后,作为潜在应用,我们展示了硅上二氧化钛结构的抗反射特性。我们的结果对于在大规模上实际实现由金属氧化物制成的无序超均匀纳米和微结构具有重要意义,从而开启了它们在湿化学组装框架中的应用。

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