Mohan Lokeshwari, Ratnasingham Sinclair R, Panidi Julianna, Daboczi Matyas, Kim Ji-Seon, Anthopoulos Thomas D, Briscoe Joe, McLachlan Martyn A, Kreouzis Theo
Department of Materials and Centre for Processable Electronics, Imperial College London, Molecular Sciences Research Hub, White City Campus, London W12 0BZ, U.K.
School of Engineering and Materials Science and Materials Research Institute, Queen Mary University of London, Mile End Road, London E1 4NS, U.K.
ACS Appl Mater Interfaces. 2021 Aug 18;13(32):38499-38507. doi: 10.1021/acsami.1c09750. Epub 2021 Aug 7.
Copper(I) thiocyanate (CuSCN) is a stable, low-cost, solution-processable p-type inorganic semiconductor used in numerous optoelectronic applications. Here, for the first time, we employ the time-of-flight (ToF) technique to measure the out-of-plane hole mobility of CuSCN films, enabled by the deposition of 4 μm-thick films using aerosol-assisted chemical vapor deposition (AACVD). A hole mobility of ∼10 cm/V s was measured with a weak electric field dependence of 0.005 cm/V. Additionally, by measuring several 1.5 μm CuSCN films, we show that the mobility is independent of thickness. To further validate the suitability of our AACVD-prepared 1.5 μm-thick CuSCN film in device applications, we demonstrate its incorporation as a hole transport layer (HTL) in methylammonium lead iodide (MAPbI) perovskite solar cells (PSCs). Our AACVD films result in devices with measured power conversion efficiencies of 10.4%, which compares favorably with devices prepared using spin-coated CuSCN HTLs (12.6%), despite the AACVD HTLs being an order of magnitude thicker than their spin-coated analogues. Improved reproducibility and decreased hysteresis were observed, owing to a combination of excellent film quality, high charge-carrier mobility, and favorable interface energetics. In addition to providing a fundamental insight into charge-carrier mobility in CuSCN, our work highlights the AACVD methodology as a scalable, versatile tool suitable for film deposition for use in optoelectronic devices.
硫氰酸亚铜(CuSCN)是一种稳定、低成本、可溶液加工的p型无机半导体,用于众多光电子应用。在此,我们首次采用飞行时间(ToF)技术来测量CuSCN薄膜的面外空穴迁移率,这是通过使用气溶胶辅助化学气相沉积(AACVD)沉积4μm厚的薄膜实现的。在弱电场依赖性为0.005 cm/V的情况下,测量得到空穴迁移率约为10 cm²/V s。此外,通过测量几个1.5μm的CuSCN薄膜,我们表明迁移率与厚度无关。为了进一步验证我们通过AACVD制备的1.5μm厚CuSCN薄膜在器件应用中的适用性,我们展示了将其作为空穴传输层(HTL)掺入甲基碘化铅(MAPbI)钙钛矿太阳能电池(PSC)中。我们的AACVD薄膜制成的器件测量得到的功率转换效率为10.4%,尽管AACVD HTL比旋涂的同类薄膜厚一个数量级,但与使用旋涂CuSCN HTL制备的器件(12.6%)相比仍具有优势。由于优异的薄膜质量、高电荷载流子迁移率和有利的界面能量学的综合作用,观察到了更好的重现性和降低的滞后现象。除了对CuSCN中的电荷载流子迁移率提供基本的见解外,我们的工作还突出了AACVD方法作为一种适用于光电器件薄膜沉积的可扩展、通用工具。