Corrigendum: High-Silica CHA Zeolite Membrane with Ultra-High Selectivity and Irradiation Stability for Krypton/Xenon Separation.
作者信息
Wang Xuerui, Zhou Tao, Zhang Ping, Yan Wenfu, Li Yongguo, Peng Li, Veerman Dylan, Shi Mengyang, Gu Xuehong, Kapteijn Freek
出版信息
Angew Chem Int Ed Engl. 2021 Sep 20;60(39):21094. doi: 10.1002/anie.202110687.
Abstract
摘要
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Corrigendum: High-Silica CHA Zeolite Membrane with Ultra-High Selectivity and Irradiation Stability for Krypton/Xenon Separation.勘误：用于氪/氙分离的具有超高选择性和辐照稳定性的高硅CHA沸石膜
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