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自组装菱形氨单层被限制在两个垂直堆叠的氧化石墨烯/石墨烯纳米片中。

Self-assembled rhomboidal ammonia monolayer confined in two vertically stacked graphene oxide/graphene nanosheets.

作者信息

Jian Zhi-Bin, Bie Jie, Chen Shuang

机构信息

Kuang Yaming Honors School and Institute for Brain Sciences, Nanjing University, Nanjing, Jiangsu 210023, China.

National Laboratory of Solid State Microstructures and Department of Physics, Nanjing University, Nanjing, Jiangsu 210093, China.

出版信息

Nanoscale. 2021 Oct 14;13(39):16615-16621. doi: 10.1039/d1nr04062f.

Abstract

Confined water molecules have attracted widespread research interest due to their versatile phase behaviors. Ammonia (NH, isoelectronic with water) molecules are also expected to realize the delicate self-assembled hydrogen-bonded network like water in confinement. Here, the structures and phase behavior of NH monolayers confined in two structurally symmetrical graphene oxide (GO) or graphene (G) nanosheets are investigated using first-principles calculations and molecular dynamics simulations. A highly ordered new rhomboidal phase with all NH molecules adopting a Y-shaped configuration, in which one N-H bond is parallel to the confining planes and two other N-H bonds point to the top/bottom GO/G layers, respectively, was discovered at low temperature, resulting from the symmetrical confinement and subtle interlayer/intermolecular interactions. Remarkably, this new phase is so stable that a quite large strain is needed to destroy it. At room temperature, these NH monolayers behave like a liquid. These rhomboidal NH monolayers confined in GO/G nanosheets not only offer diverse hydrogen-bonded networks but also possess potential piezoelectricity for future device applications.

摘要

受限水分子因其多样的相行为而引起了广泛的研究兴趣。氨(NH₃,与水等电子体)分子也有望在受限条件下像水一样形成精细的自组装氢键网络。在此,利用第一性原理计算和分子动力学模拟研究了限制在两种结构对称的氧化石墨烯(GO)或石墨烯(G)纳米片中的NH₃单层的结构和相行为。在低温下发现了一种高度有序的新菱形相,其中所有NH₃分子都呈Y形构型,一个N-H键平行于限制平面,另外两个N-H键分别指向顶部/底部的GO/G层,这是由对称限制和微妙的层间/分子间相互作用导致的。值得注意的是,这个新相非常稳定,需要相当大的应变才能破坏它。在室温下,这些NH₃单层表现得像液体。这些限制在GO/G纳米片中的菱形NH₃单层不仅提供了多样的氢键网络,而且还具有用于未来器件应用的潜在压电性。

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