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利用同步辐射对CuO/CuO半导体双层膜中的局部光致发光特性进行高分辨率映射。

High-Resolution Mapping of Local Photoluminescence Properties in CuO/CuO Semiconductor Bi-Layers by Using Synchrotron Radiation.

作者信息

Kobayashi Masakazu, Izaki Masanobu, Khoo Pei Loon, Shinagawa Tsutomu, Takeuchi Akihisa, Uesugi Kentaro

机构信息

Department of Mechanical Engineering, Toyohashi University of Technology, Toyohashi 441-8580, Japan.

Osaka Research Institute of Industrial Science and Technology, Osaka 536-8553, Japan.

出版信息

Materials (Basel). 2021 Sep 25;14(19):5570. doi: 10.3390/ma14195570.

Abstract

The quality of a semiconductor, which strongly affects its performance, can be estimated by its photoluminescence, which closely relates to the defect and impurity energy levels. In light of this, it is necessary to have a measurement method for photoluminescence properties with spatial resolution at the sub-micron or nanoscale. In this study, a mapping method for local photoluminescence properties was developed using a focused synchrotron radiation X-ray beam to evaluate localized photoluminescence in bi-layered semiconductors. CuO/CuO/ZnO semiconductors were prepared on F:SnO/soda-lime glass substrates by means of electrodeposition. The synchrotron radiation experiment was conducted at the beamline 20XU in the Japanese synchrotron radiation facility, SPring-8. By mounting the high-sensitivity spectrum analyzer near the edge of the CuO/CuO/ZnO devices, luminescence maps of the semiconductor were obtained with unit sizes of 0.3 μm × 0.3 μm. The devices were scanned in 2D. Light emission 2D maps were created by classifying the obtained spectra based on emission energy already reported by M. Izaki, et al. Band-like structures corresponding to the stacking layers of CuO/CuO/ZnO were visualized. The intensities of emissions at different energies at each position can be associated with localized photovoltaic properties. This result suggests the validity of the method for investigation of localized photoluminescence related to the semiconductor quality.

摘要

半导体的质量对其性能有很大影响,可通过与缺陷和杂质能级密切相关的光致发光来估计。鉴于此,有必要具备一种用于测量亚微米或纳米级空间分辨率光致发光特性的方法。在本研究中,利用聚焦同步辐射X射线束开发了一种局部光致发光特性的映射方法,以评估双层半导体中的局部光致发光。通过电沉积在F:SnO/钠钙玻璃基板上制备了CuO/CuO/ZnO半导体。同步辐射实验在日本同步辐射设施SPring-8的20XU光束线进行。通过在CuO/CuO/ZnO器件边缘附近安装高灵敏度光谱分析仪,获得了单位尺寸为0.3μm×0.3μm的半导体发光图。对器件进行二维扫描。通过根据M. Izaki等人已经报道过的发射能量对获得的光谱进行分类,创建了发光二维图。对应于CuO/CuO/ZnO堆叠层的带状结构得以可视化。每个位置不同能量处的发射强度可与局部光伏特性相关联。这一结果表明该方法对于研究与半导体质量相关的局部光致发光是有效的。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3e2f/8509730/c083c2fffcc5/materials-14-05570-g001.jpg

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