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一种自主超快自愈、高度无色、抗撕裂且柔顺的弹性体,专为集成在柔性和光电子学中的透明电磁干扰屏蔽膜量身定制。

An autonomously ultrafast self-healing, highly colourless, tear-resistant and compliant elastomer tailored for transparent electromagnetic interference shielding films integrated in flexible and optical electronics.

作者信息

Sun FuYao, Xu JianHua, Liu Tong, Li FeiFei, Poo Yin, Zhang YaNa, Xiong RanHua, Huang ChaoBo, Fu JiaJun

机构信息

Joint Laboratory of Advanced Biomedical Materials (NFU-UGent), College of Chemical Engineering, Nanjing Forestry University, 210037, China.

School of Chemical Engineering, Nanjing University of Science and Technology, 210094, China.

出版信息

Mater Horiz. 2021 Nov 29;8(12):3356-3367. doi: 10.1039/d1mh01199e.

DOI:10.1039/d1mh01199e
PMID:34657943
Abstract

Considering the operation reliability of flexible and optical electronics (FOEs) in dynamic and real-world environments, autonomous self-healing electromagnetic interference (EMI) shielding materials with high transparency, good stretchability and excellent tear-resistance are urgently required but always difficult to achieve due to the poor dynamics of their elastic substrates. Herein, we propose a facile strategy to design a highly dynamic polyurea elastomer (PDMS-MPI-HDI) featuring with ultrahigh optical transparency (>94%), ultralow elastic modulus (<1 MPa), high tear-resistant stretchability (800%), and ultrafast autonomous self-healing (100 s for scratch-healing). Taking PDMS-MPI-HDI as a substrate for embedding silver nanowires (Ag NWs), the first transparent, stretchable and self-healable EMI shielding materials (Ag NWs/PDMS-MPI-HDI) are presented. Failure behavior of Ag NWs/PDMS-MPI-HDI is highly tolerant of prefabricated cracks under deformation. Due to the robust interfacial adhesion between Ag NWs and PDMS-MPI-HDI, the fractured Ag NW network can autonomously self-reconstruct during the healing process of PDMS-MPI-HDI substrates, contributing to the complete restoration of EMI shielding effectiveness (SE) and full erasure of scratches at both the resting and stretching states. Besides, Ag NWs/PDMS-MPI-HDI exhibits fast autonomous self-healing at high (60 °C) and low (0 °C) temperatures, and in artificial sweat, which is essential for FOEs applicable in various practical environments.

摘要

考虑到柔性和光电子器件(FOEs)在动态和现实环境中的运行可靠性,迫切需要具有高透明度、良好拉伸性和优异抗撕裂性的自主自修复电磁干扰(EMI)屏蔽材料,但由于其弹性基板的动力学性能较差,这些材料一直难以实现。在此,我们提出了一种简便的策略来设计一种高动态聚脲弹性体(PDMS-MPI-HDI),其具有超高的光学透明度(>94%)、超低的弹性模量(<1 MPa)、高抗撕裂拉伸性(800%)和超快的自主自修复能力(划痕修复时间为100秒)。以PDMS-MPI-HDI为嵌入银纳米线(Ag NWs)的基板,首次展示了透明、可拉伸且自愈合的EMI屏蔽材料(Ag NWs/PDMS-MPI-HDI)。Ag NWs/PDMS-MPI-HDI的失效行为对变形下的预制裂纹具有高度耐受性。由于Ag NWs与PDMS-MPI-HDI之间具有强大的界面粘附力,断裂的Ag NW网络在PDMS-MPI-HDI基板的愈合过程中能够自主自我重构,有助于在静止和拉伸状态下完全恢复EMI屏蔽效能(SE)并完全消除划痕。此外,Ag NWs/PDMS-MPI-HDI在高温(60°C)和低温(0°C)以及人工汗液中均表现出快速的自主自修复能力,这对于适用于各种实际环境的FOEs至关重要。

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