Ji Zhe, Lin Qiang, Huang Zhewei, Chen Sulin, Gong Peng, Sun Zhengzong, Shen Bin
School of Mechanical Engineering and State Key Laboratory of Mechanical System and Vibration, Shanghai Jiao Tong University, Shanghai 200240, China.
Department of Chemistry and Shanghai Key Laboratory of Molecular Catalysis and Innovative Materials, Fudan University, Shanghai 200433, China.
ACS Appl Mater Interfaces. 2021 Nov 3;13(43):51608-51617. doi: 10.1021/acsami.1c11717. Epub 2021 Oct 22.
Graphene nanowall (GNW) films, a representation of three-dimensional (3D) carbon nanomaterial films, are emerging as promising candidates for applications in electric devices and composites, on account of their 3D structures and exceptional properties of graphene sheets. However, the frictional responses of GNW films, which exhibit significant influence on their performances, have seldom been reported. Herein, we reported a growth process of a GNW film by the chemical vapor deposition method and studied the frictional behavior of the GNW film for the first time. The results demonstrated the nonlinearity between the frictional force of the GNW film and normal load. Based on the structural evolution of the GNW film with normal load and frictional tests on precompressed GNW films, the influence of the strain property of the GNW film, namely, the strengthening effect, could be confirmed. The results of molecular dynamics simulations show that the bending force of GNWs in front of the tip plays a determinate role in the frictional force of the GNW film. Furthermore, the bending force is proportional to the bending contact area, which increases nonlinearly with the normal load due to the strengthening effect of the GNW film. The result suggests that the nonlinear increase of the bending contact area induced by the strengthening effect of the GNW film is the key factor that leads to its nonlinear frictional force. This study provides a novel insight into the frictional responses of GNW films, which would be beneficial for the design and application of electric devices and composites made of GNW and other 3D carbon nanomaterial films.
石墨烯纳米墙(GNW)薄膜作为三维(3D)碳纳米材料薄膜的一种,因其3D结构和石墨烯片优异的性能,正成为电子器件和复合材料应用中很有前景的候选材料。然而,对其性能有显著影响的GNW薄膜的摩擦响应却鲜有报道。在此,我们报道了一种通过化学气相沉积法生长GNW薄膜的过程,并首次研究了GNW薄膜的摩擦行为。结果表明GNW薄膜的摩擦力与法向载荷之间存在非线性关系。基于GNW薄膜随法向载荷的结构演变以及对预压缩GNW薄膜的摩擦测试,可以证实GNW薄膜应变特性(即强化效应)的影响。分子动力学模拟结果表明,尖端前方GNW的弯曲力在GNW薄膜的摩擦力中起决定性作用。此外,弯曲力与弯曲接触面积成正比,由于GNW薄膜的强化效应,弯曲接触面积随法向载荷呈非线性增加。结果表明,GNW薄膜强化效应引起的弯曲接触面积的非线性增加是导致其摩擦力非线性的关键因素。本研究为GNW薄膜的摩擦响应提供了新的见解,这将有利于由GNW和其他3D碳纳米材料薄膜制成的电子器件和复合材料的设计与应用。