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一种用于屏蔽差分硅通孔的各向异性等效热模型。

An Anisotropic Equivalent Thermal Model for Shield Differential Through-Silicon Vias.

作者信息

Shan Guangbao, Li Guoliang, Chen Dongdong, Yang Zifeng, Li Di, Yang Yintang

机构信息

School of Microelectronics, Xidian University, Xi'an 710071, China.

出版信息

Micromachines (Basel). 2021 Oct 7;12(10):1223. doi: 10.3390/mi12101223.

Abstract

An accurate equivalent thermal model is proposed to calculate the equivalent thermal conductivity (ETC) of shield differential through-silicon via (SDTSV). The mathematical expressions of ETC in both horizontal and vertical directions are deduced by considering the anisotropy of SDTSV. The accuracy of the proposed model is verified by the finite element method (FEM), and the average errors of temperature along the X-axis, Y-axis, diagonal line, and vertical directions are 1.37%, 3.42%, 1.76%, and 0.40%, respectively. Compared with COMSOL, the proposed model greatly improves the computational efficiency. Moreover, the effects of different parameters on the thermal distribution of SDTSV are also investigated. The thermal conductivity is decreased with the increase in thickness of SiO. With the increase in pitch, the maximum temperature of SDTSV increases very slowly when β = 0° , and decreases very slowly when β = 90°. The proposed model can be used to accurately and quickly describe the thermal distribution of SDTSV, which has a great prospect in the design of 3D IC.

摘要

提出了一种精确的等效热模型来计算屏蔽差分硅通孔(SDTSV)的等效热导率(ETC)。通过考虑SDTSV的各向异性,推导了ETC在水平和垂直方向上的数学表达式。采用有限元方法(FEM)验证了所提模型的准确性,沿X轴、Y轴、对角线和垂直方向的温度平均误差分别为1.37%、3.42%、1.76%和0.40%。与COMSOL相比,所提模型大大提高了计算效率。此外,还研究了不同参数对SDTSV热分布的影响。随着SiO厚度的增加,热导率降低。随着间距的增加,当β = 0°时,SDTSV的最高温度上升非常缓慢,当β = 90°时,下降非常缓慢。所提模型可用于准确快速地描述SDTSV的热分布,在3D IC设计中具有广阔前景。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7d8a/8540555/ff124a405ba4/micromachines-12-01223-g001.jpg

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