Camillo Lara, Gironi Laura C, Zavattaro Elisa, Esposto Elia, Savoia Paola
Department of Health Sciences, University of Eastern Piedmont, Novara, Italy.
Maggiore della Carità University Hospital, Novara, Italy.
J Invest Dermatol. 2022 May;142(5):1466-1477.e1. doi: 10.1016/j.jid.2021.10.012. Epub 2021 Oct 23.
UVB radiation directly damages DNA, increases ROS and nitric oxide (NO) release, and promotes inflammation leading to genomic instability and cell death. Nicotinamide (NAM) is the precursor of NAM adenine dinucleotide, essential for cell energy production and DNA damage repair. NAM protects HaCat cells from UV-induced impairment; however, little is known about its effects on human primary keratinocytes and those isolated from field cancerization (i.e., field cancerization human primary keratinocytes [FC-HPKs]). We examined the role of NAM against UV-induced oxidative stress damages in FC-HPKs, isolated from precancerous lesions and skin cancers, and in normal human epidermal keratinocytes. Cells were treated for 18, 24, and 48 hours with NAM (5, 25, and 50 μM, respectively) before UVB irradiation. FC-HPK showed four-fold higher basal ROS levels than normal human epidermal keratinocytes; NAM downregulated ROS production only in irradiated FC-HPKs, which showed a greater sensibility to UV rays. UV exposure increased OGG1, inducible nitric oxide synthase, and IL-1β expression, an effect counteracted by NAM pretreatment. Intracellular nitric oxide production and DNA damages were inhibited by NAM exposure before irradiation. Collectively, our findings indicate that pretreatment with 25 μM NAM 24 hours before UVB irradiation effectively prevents oxidative stress formation, DNA damage, and inflammation in both normal human epidermal keratinocytes and FC-HPKs.
紫外线B(UVB)辐射直接损伤DNA,增加活性氧(ROS)和一氧化氮(NO)释放,并促进炎症反应,导致基因组不稳定和细胞死亡。烟酰胺(NAM)是烟酰胺腺嘌呤二核苷酸的前体,对细胞能量产生和DNA损伤修复至关重要。NAM可保护HaCaT细胞免受紫外线诱导的损伤;然而,其对人原代角质形成细胞以及从场癌化中分离出的细胞(即场癌化人原代角质形成细胞[FC-HPKs])的影响知之甚少。我们研究了NAM对从癌前病变和皮肤癌中分离出的FC-HPKs以及正常人表皮角质形成细胞中紫外线诱导的氧化应激损伤的作用。在紫外线B照射前,分别用5、25和50μM的NAM处理细胞18、24和48小时。FC-HPK的基础ROS水平比正常人表皮角质形成细胞高四倍;NAM仅在照射后的FC-HPK中下调ROS产生,这些细胞对紫外线更敏感。紫外线照射增加了OGG1、诱导型一氧化氮合酶和IL-1β的表达,NAM预处理可抵消这种作用。照射前暴露于NAM可抑制细胞内一氧化氮产生和DNA损伤。总体而言,我们的研究结果表明,在紫外线B照射前24小时用25μM NAM预处理可有效预防正常人表皮角质形成细胞和FC-HPKs中的氧化应激形成、DNA损伤和炎症。