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氧空位与氮掺杂协同提升TiO负载的Pd催化剂用于CO光还原的性能及稳定性:一项密度泛函理论研究

Oxygen vacancy and nitrogen doping collaboratively boost performance and stability of TiO-supported Pd catalysts for CO photoreduction: a DFT study.

作者信息

Zheng Mingyue, Yang Jing, Fan Weiliu, Zhao Xian

机构信息

School of Chemistry and Chemical Engineering, State Key Laboratory of Crystal Materials, Shandong University, Jinan 250100, China.

College of Chemical Engineering, Shijiazhuang University, Shijiazhuang, 050035, P. R. China.

出版信息

Phys Chem Chem Phys. 2021 Nov 10;23(43):24801-24813. doi: 10.1039/d1cp03693a.

Abstract

The regulation of interfacial charge transfer, optimization of active sites, and maintenance of stability are effective strategies for improving catalytic performance. The effect of the oxygen vacancy (V) and nitrogen doping on these parameters for CO photoreduction on Pd/TiO(101) was studied using density functional theory calculations. The results demonstrate that introduction of the V could trigger reversed electron transfer, making the V and Pd atoms the active center for CO reduction. However, the V is repaired by the dissociated O atom. The combined effect of the V and N is related to the position of N. Although the substitutional N (N) can delocalize electrons at the V, it cannot improve the activity and stability. The interstitial N (N) located below the V forms N-Ti bonds with two Ti atoms adjacent to the V. This can delocalize the electrons near the V, and the five-fold-coordinated titanium (Ti) replaces the V as the active center, thus enhancing the reactivity and protecting the V. Further research indicates that the co-modification of the V and N improves photoexcited electron transfer and distribution, which would in turn promote CO reduction. The results of this study propose that surface defect engineering holds great promise for boosting CO photoreduction by integrating functions of electron density modulation and catalysis.

摘要

界面电荷转移的调控、活性位点的优化以及稳定性的维持是提高催化性能的有效策略。利用密度泛函理论计算研究了氧空位(V)和氮掺杂对Pd/TiO(101)上CO光还原这些参数的影响。结果表明,V的引入会引发反向电子转移,使V和Pd原子成为CO还原的活性中心。然而,V会被解离的O原子修复。V和N的联合效应与N的位置有关。虽然取代N(N)能使V处的电子离域,但不能提高活性和稳定性。位于V下方的间隙N(N)与V相邻的两个Ti原子形成N-Ti键。这能使V附近的电子离域,且五重配位的钛(Ti)取代V成为活性中心,从而提高反应活性并保护V。进一步研究表明,V和N的共修饰改善了光激发电子的转移和分布,进而促进了CO还原。本研究结果表明,通过整合电子密度调制和催化功能,表面缺陷工程在促进CO光还原方面具有巨大潜力。

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