Xiong Xin, Shimizu Yuki, Matsukuma Hiraku, Gao Wei
Department of Finemechanics, Tohoku University, Sendai 980-8579, Japan.
The State Key Lab of Fluid Power and Mechatronic Systems, Zhejiang University, Hangzhou 310027, China.
Sensors (Basel). 2021 Nov 8;21(21):7412. doi: 10.3390/s21217412.
An interferometric self-calibration method for the evaluation of the pitch deviation of scale grating has been extended to evaluate the pitch deviation of the long-range type linear scale by utilizing the stitching interferometry technique. Following the previous work, in which the interferometric self-calibration method was proposed to assess the pitch deviation of the scale grating by combing the first-order diffracted beams from the grating, a stitching calibration method is proposed to enlarge the measurement range. Theoretical analysis is performed to realize the -directional pitch deviation calibration of the long-range linear scale while reducing the second-order accumulation effect by canceling the influence of the reference flat error in the sub-apertures' measurements. In this paper, the stitching interferometry theory is briefly reviewed, and theoretical equations of the -directional pitch deviation stitching are derived for evaluation of the pitch deviation of the long-range linear scale. Followed by the simulation verification, some experiments with a linear scale of 105 mm length from a commercial interferential scanning-type optical encoder are conducted to verify the feasibility of the self-calibration stitching method for the calibration of the -directional pitch deviation of the linear scale over its whole area.
一种用于评估光栅尺节距偏差的干涉自校准方法已通过利用拼接干涉测量技术扩展到评估长量程型线性标尺的节距偏差。继先前提出的通过组合来自光栅的一阶衍射光束来评估光栅尺节距偏差的干涉自校准方法之后，本文提出了一种拼接校准方法以扩大测量范围。进行了理论分析，以实现长量程线性标尺的y方向节距偏差校准，同时通过消除子孔径测量中参考平面误差的影响来减少二阶累积效应。本文简要回顾了拼接干涉测量理论，并推导了y方向节距偏差拼接的理论方程，用于评估长量程线性标尺的节距偏差。在仿真验证之后，对来自商用干涉扫描型光学编码器的长度为105 mm的线性标尺进行了一些实验，以验证自校准拼接方法在整个区域校准线性标尺y方向节距偏差的可行性。
