Li Xin, Zhang Zhongshuai, Huo Yanyan, Zhao Lina, Yue Qingyang, Jiang Shouzhen, Liang Huawei, Gao Yuanmei, Ning Tingyin
Shandong Provincial Engineering and Technical Center of Light Manipulations, Shandong Provincial Key Laboratory of Optics and Photonic Device, School of Physics and Electronics, Shandong Normal University, Jinan 250358, China.
Shenzhen Key Laboratory of Laser Engineering, College of Physics and Optoelectronic Engineering, Shenzhen University, Shenzhen 518060, China.
Nanomaterials (Basel). 2021 Oct 26;11(11):2843. doi: 10.3390/nano11112843.
We model optical bistability in all-dielectric guide-mode resonance grating (GMR) nanostructures working at quasi-bound states in the continuum (BICs). The complementary metal-oxide-semiconductor (CMOS) compatible material silicon nitride (SiN) is used for the design of nanostructures and simulations. The ultra-low threshold of input intensity in the feasible nanostructure for nanofabrication is obtained at the level of ~100 W/cm driven by quasi-BICs. Additionally, the resonance wavelength in the GMR nanostructure can be widely tuned by incident angles with the slightly changed -factor that enables the optical bistable devices to work efficiently over a wide spectrum. The impact of the defects of grating that may be introduced in the fabrication process on the optical properties is discussed, and the tolerance of the defects to the optical performance of the device is confirmed. The results indicate that the GMR nanostructures of broadband and ultra-low threshold optical bistability driven by quasi-BICs are promising in the application of all-optical devices.
我们对在连续统中的准束缚态(BICs)下工作的全介质导模共振光栅(GMR)纳米结构中的光学双稳性进行了建模。采用互补金属氧化物半导体(CMOS)兼容材料氮化硅(SiN)进行纳米结构设计和模拟。在由准BICs驱动的可行纳米结构中,纳米制造的输入强度超低阈值在~100 W/cm的水平上获得。此外,GMR纳米结构中的共振波长可以通过入射角进行广泛调谐,其品质因数略有变化,这使得光学双稳器件能够在宽光谱范围内高效工作。讨论了在制造过程中可能引入的光栅缺陷对光学性质的影响,并证实了缺陷对器件光学性能的耐受性。结果表明,由准BICs驱动的具有宽带和超低阈值光学双稳性的GMR纳米结构在全光器件应用中具有广阔前景。