Öztürk Osman, Haşimoğlu Aydın, Özdemir Oğuz Kaan, Karaaslan İnci, Ahsen Ali Şems
Department of Physics, Gebze Technical University, Kocaeli Turkey.
Nanotechnology Research Center, Gebze Technical University, Kocaeli Turkey.
Turk J Chem. 2021 Oct 19;45(5):1336-1352. doi: 10.3906/kim-2101-50. eCollection 2021.
A series of thin Pt-Co films with different metal ratios were deposited by using the sequential cosputtering directly on a commercial hydrophobic carbon paper substrate at room temperature and in ultra-high vacuum (UHV) conditions. Their electrocatalytic properties toward the oxygen reduction reaction were investigated in 0.5 M HSO solution by means of cyclic voltammetry (CV) and linear sweep voltammetry (LSV) on rotating disc electrode (RDE). The results showed that Pt particles, deposited by dc-magnetron gun, surround the large Co-clusters deposited by rf-magnetron gun. In addition, the increase of Co content led to an increase in the electrochemical active surface area (EASA) from 23.75 m/gPt to 47.54 m/gPt for pure Pt and Pt:Co (1:3), respectively, which corresponded the improvement of the utilization of Pt by a factor of 1.91. This improvement indicated that the sequential magnetron cosputtering was one of the essential technique to deposit homogeneous metal clusters with desirable size on the gas diffusion layer by adjustment plasma parameters.
通过顺序共溅射,在室温及超高真空(UHV)条件下,直接在商用疏水碳纸基底上沉积了一系列具有不同金属比例的薄铂钴薄膜。在旋转圆盘电极(RDE)上,通过循环伏安法(CV)和线性扫描伏安法(LSV),在0.5 M硫酸溶液中研究了它们对氧还原反应的电催化性能。结果表明,由直流磁控枪沉积的铂颗粒围绕着由射频磁控枪沉积的大钴团簇。此外,钴含量的增加导致纯铂和铂:钴(1:3)的电化学活性表面积(EASA)分别从23.75 m²/gPt增加到47.54 m²/gPt,这相当于铂的利用率提高了1.91倍。这种改进表明,顺序磁控共溅射是通过调整等离子体参数在气体扩散层上沉积具有理想尺寸的均匀金属团簇的关键技术之一。