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电流密度对电沉积镍涂层微观结构和形貌的影响。

Effect of current density on the microstructure and morphology of the electrodeposited nickel coatings.

作者信息

Boukhouiete Amel, Boumendjel Saliha, Sobhi Nour-El-Houda

机构信息

Laboratory of Physical Metallurgy and Property of Materials, Badji-Mokhtar University, Annaba Algeria.

Hassiba Benbouali-Chlef University Algeria.

出版信息

Turk J Chem. 2021 Oct 19;45(5):1599-1608. doi: 10.3906/kim-2102-46. eCollection 2021.

Abstract

The aim of this research work was to study the effect of deposition current density on microstructure and surface morphology of electrodeposited nickel coatings. For this purpose, nickel deposits have been synthesized by direct current from Watts bath without additive, to limit the incorporation of pollutants resulting from surface adsorption or electro-activity of these compounds. Nickel deposits have been investigated by scanning electron microscopy and X-ray diffraction. Cyclic voltammetry was also used to gain information on the general behavior of the deposition. The optimum conditions of deposition were established and the influence of current density on the grain size, surface morphology, and crystal orientation was determined.

摘要

本研究工作的目的是研究沉积电流密度对电沉积镍涂层微观结构和表面形貌的影响。为此,通过直流电从瓦特镀液中合成镍沉积物,且不添加添加剂,以限制因这些化合物的表面吸附或电活性而导致的污染物掺入。通过扫描电子显微镜和X射线衍射对镍沉积物进行了研究。还使用循环伏安法来获取有关沉积一般行为的信息。确定了最佳沉积条件,并测定了电流密度对晶粒尺寸、表面形貌和晶体取向的影响。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b82e/8596559/4163c03e9a46/turkjchem-45-1599-fig001.jpg

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