School of Materials Science and Engineering, Jiangxi Key Laboratory for Two-Dimensional Materials, Nanchang University, 330031, Nanchang, P. R. China.
Chemphyschem. 2022 Feb 4;23(3):e202100790. doi: 10.1002/cphc.202100790. Epub 2021 Dec 18.
There is still a lack of deep understanding on the reaction kinetics and mechanism of thiol etching of gold. Herein, by using the sensor of quartz crystal microbalance (QCM) as the sacrificial probe, the etching reaction of gold has been studied by employing cysteamine (CS) as a typical thiol etchant. The etching reaction is verified as diffusion-controlled and shows a half-order reaction kinetics. It is demonstrated that intact thiol and amino on CS are both crucial for its etching ability to gold. Applied potentials can affect the electron transfer and hence can be used to regulate the gold etching. Our results also reveal that only two carbon atoms of the spacer between thiol and amino on CS are very critical to the excellent etching ability. This work exhibits a new route to explore the thiol etching reaction of gold and elucidates the reaction kinetics and mechanism.
人们对金的巯基刻蚀反应动力学和机理仍缺乏深入的了解。在此，我们采用石英晶体微天平（QCM）作为牺牲探针，以半胱胺（CS）作为典型的巯基蚀刻剂研究了金的刻蚀反应。该刻蚀反应被验证为扩散控制，并呈现半级反应动力学。研究表明，CS 中的完整巯基和氨基对于其对金的蚀刻能力都是至关重要的。外加电位会影响电子转移，因此可以用来调节金的刻蚀。我们的结果还表明，CS 中巯基和氨基之间的间隔的两个碳原子对于优异的蚀刻能力非常关键。这项工作展示了探索金的巯基刻蚀反应的新途径，并阐明了反应动力学和机理。
