Department of Stomatology, Fujian Provincial Hospital, Fujian, China.
Second Dental Center, Peking University School and Hospital of Stomatology, Beijing, China.
Eur J Oral Sci. 2022 Feb;130(1):e12833. doi: 10.1111/eos.12833. Epub 2022 Jan 10.
This study was designed to investigate the influence of diameter reductions on the stress distribution around root-analogue implants via 3D finite element analysis. Four root-analogue implant models with different diameter reductions (0, 1, 2, or 3 mm), a traditional threaded implant and congruent bone models were created through reverse engineering. A 100-N force was applied parallel with and in a 45° angle to the implant axis, respectively. The stress concentration in the labial neck area around implants with 1-2 mm diameter reduction was lower than seen with no reduction. When the implant diameter was reduced by 3 mm, there were obvious stress concentrations in both implant and bone (the maximum stress was 206 and 111 MPa, respectively). In other groups, the maximum stress was 65.1 MPa in the bone and 108 MPa in the implant. Additionally, the stress concentration in the bone around the root-analogue implant when the implant diameter was reduced by 0-2 mm (maximum stress of 65.1 MPa) was obviously smaller than that around the traditional implant (maximum stress 130.4 MPa). Reducing the diameter of maxillary central incisor root-analogue implants by up to 2 mm next to the labial cortical bone could help disperse stress.
本研究旨在通过三维有限元分析研究直径减小对根状模拟种植体周围应力分布的影响。通过逆向工程，创建了四个具有不同直径减小（0、1、2 或 3mm）的根状模拟种植体模型、一个传统螺纹种植体和一致骨模型。以平行于种植体轴和以 45°角的方式分别施加 100N 的力。与无减小相比，直径减小 1-2mm 的种植体周围唇侧颈部区域的应力集中较低。当种植体直径减小 3mm 时，种植体和骨中都出现明显的应力集中（最大应力分别为 206 和 111MPa）。在其他组中，骨中的最大应力为 65.1MPa，种植体中的最大应力为 108MPa。此外，当唇侧皮质骨附近的种植体直径减小 0-2mm 时，根状模拟种植体周围骨中的应力集中（最大应力为 65.1MPa）明显小于传统种植体周围的应力集中（最大应力为 130.4MPa）。在上颌中切牙根状模拟种植体的唇侧皮质骨旁边减小直径达 2mm 可以帮助分散应力。
