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大成分范围纯相均匀铟砷锑纳米线

Large-Composition-Range Pure-Phase Homogeneous InAsSb Nanowires.

作者信息

Wen Lianjun, Pan Dong, Liu Lei, Tong Shucheng, Zhuo Ran, Zhao Jianhua

机构信息

State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, China.

College of Materials Sciences and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing 100049, China.

出版信息

J Phys Chem Lett. 2022 Jan 20;13(2):598-605. doi: 10.1021/acs.jpclett.1c04001. Epub 2022 Jan 12.

Abstract

Narrow bandgap InAsSb nanowires show broad prospects for applications in wide spectrum infrared detectors, high-performance transistors, and quantum computation. Realizing such applications requires a fine control of the composition and crystal structure of nanowires. However, the fabrication of large-composition-range pure-phase homogeneous InAsSb nanowires remains a huge challenge. Here, we first report the growth of large-composition-range stemless InAsSb nanowires (0 ≤ ≤ 0.63) on Si (111) substrates by molecular beam epitaxy. We find that pure-phase InAsSb nanowires can be successfully obtained by controlling the antimony content , nanowire diameter, and nanowire growth direction. Detailed energy dispersive spectrum data show that the antimony is uniformly distributed along the axial and radial directions of InAsSb nanowires and no spontaneous core-shell nanostructures form in the nanowires. On the basis of field-effect measurements, we confirm that InAsSb nanowires exhibit good conductivity and their mobilities can reach 4200 cm V s at 7 K. Our work lays the foundation for the development of InAsSb nanowire optoelectronic, electronic, and quantum devices.

摘要

窄带隙InAsSb纳米线在宽光谱红外探测器、高性能晶体管和量子计算等应用中展现出广阔前景。实现此类应用需要对纳米线的成分和晶体结构进行精细控制。然而,制备大成分范围的纯相均匀InAsSb纳米线仍然是一个巨大挑战。在此,我们首次报道了通过分子束外延在Si(111)衬底上生长大成分范围的无茎InAsSb纳米线(0≤≤0.63)。我们发现,通过控制锑含量、纳米线直径和纳米线生长方向,可以成功获得纯相InAsSb纳米线。详细的能量色散谱数据表明,锑沿InAsSb纳米线的轴向和径向均匀分布,纳米线中未形成自发的核壳纳米结构。基于场效应测量,我们证实InAsSb纳米线具有良好的导电性,其迁移率在7 K时可达到4200 cm V s。我们的工作为InAsSb纳米线光电器件、电子器件和量子器件的发展奠定了基础。

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