Suppr超能文献

化学剥离的WS和MoS上电位依赖性甲基化的实验与理论比较

Experimental and Theoretical Comparison of Potential-dependent Methylation on Chemically Exfoliated WS and MoS.

作者信息

Yan Ellen, Balgley Renata, Morla Maureen B, Kwon Soonho, Musgrave Charles B, Brunschwig Bruce S, Goddard William A, Lewis Nathan S

机构信息

Division of Chemistry and Chemical Engineering, California Institute of Technology, Pasadena, California 91125, United States.

Material and Process Simulation Center, California Institute of Technology, Pasadena, California 91125, United States.

出版信息

ACS Appl Mater Interfaces. 2022 Feb 23;14(7):9744-9753. doi: 10.1021/acsami.1c20949. Epub 2022 Feb 11.

Abstract

Reductant-activated functionalization is shown to enhance the methylation of chemically exfoliated MoS (MoS) and WS by introducing excess negative charge to facilitate a nucleophilic attack reaction. Relative to methylation in the absence of a reductant, the reaction produces a twofold increase in coverage of WS, from 25 to 52% coverage per WS. However, at every potential, the methyl coverage on WS was ∼20% lower than that on MoS. We applied grand canonical density functional theory to show that at constant potential, more negative charge is present on 1T'-MoS than on 1T'-WS, making methylation both thermodynamically and kinetically more favorable for 1T'-MoS than 1T'-WS. This effect was moderated when the reactions were compared at constant charge, emphasizing the importance of comparing the reactivity of materials at nominally identical electrode potentials.

摘要

研究表明,通过引入过量负电荷以促进亲核攻击反应,还原剂活化功能化可增强化学剥离的MoS₂(二硫化钼)和WS₂(二硫化钨)的甲基化。相对于无还原剂时的甲基化,该反应使WS₂的覆盖率提高了两倍,从每个WS₂的25%覆盖率提高到52%。然而,在每个电位下,WS₂上的甲基覆盖率比MoS₂上的低约20%。我们应用巨正则密度泛函理论表明,在恒定电位下,1T'-MoS₂上的负电荷比1T'-WS₂上的更多,这使得甲基化在热力学和动力学上对1T'-MoS₂比对1T'-WS₂更有利。当在恒定电荷下比较反应时,这种效应得到了缓和,强调了在名义上相同的电极电位下比较材料反应活性的重要性。

文献检索

告别复杂PubMed语法,用中文像聊天一样搜索,搜遍4000万医学文献。AI智能推荐,让科研检索更轻松。

立即免费搜索

文件翻译

保留排版,准确专业,支持PDF/Word/PPT等文件格式,支持 12+语言互译。

免费翻译文档

深度研究

AI帮你快速写综述,25分钟生成高质量综述,智能提取关键信息,辅助科研写作。

立即免费体验