Long Guoyun, Zhang Yaoping, Fan Junqi, Guan Chunlin
Appl Opt. 2022 Jan 1;61(1):188-195. doi: 10.1364/AO.441444.
A theoretically designed rotating shadow mask is proposed to optimize the uniformity of a simple rotation system, which makes full use of the width of the coating chamber. This method can fabricate a large-aperture optical component, the diameter of which is more than half the width of the coating machine. The rotating shadow mask is applied to correct the film thickness uniformity near the center point of simple plane substrate. The factors influencing the effect of the rotating shadow mask are simulated and discussed. Then the shape of the rotating shadow mask is theoretically designed, and the uniformity within a corresponding radius is well corrected. After determining the shape of the rotating shadow mask, an additional fixed shadow mask is calculated and used to improve the uniformity of the entire substrate. Through the application of the two shadow masks together, uniformity about 99.5% is obtained in the diameter of 640 mm on a 1100 mm coating machine.
提出了一种理论设计的旋转荫罩，以优化简单旋转系统的均匀性，该系统充分利用了镀膜室的宽度。该方法可以制造大口径光学元件，其直径超过镀膜机宽度的一半。旋转荫罩用于校正简单平面基板中心点附近的膜厚均匀性。模拟并讨论了影响旋转荫罩效果的因素。然后从理论上设计了旋转荫罩的形状，并很好地校正了相应半径内的均匀性。在确定旋转荫罩的形状后，计算并使用了一个额外的固定荫罩来提高整个基板的均匀性。通过一起应用这两种荫罩，在1100毫米镀膜机上640毫米直径范围内获得了约99.5%的均匀性。
