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单层二硫化钼基面硫空位的局部结构

Local Structure of Sulfur Vacancies on the Basal Plane of Monolayer MoS.

作者信息

Garcia-Esparza Angel T, Park Sangwook, Abroshan Hadi, Paredes Mellone Oscar A, Vinson John, Abraham Baxter, Kim Taeho R, Nordlund Dennis, Gallo Alessandro, Alonso-Mori Roberto, Zheng Xiaolin, Sokaras Dimosthenis

机构信息

Stanford Synchrotron Radiation Lightsource, SLAC National Accelerator Laboratory, 2575 Sand Hill Road, Menlo Park, California 94025, United States.

Department of Mechanical Engineering, Stanford University, Stanford, California 94305, United States.

出版信息

ACS Nano. 2022 Apr 26;16(4):6725-6733. doi: 10.1021/acsnano.2c01388. Epub 2022 Apr 5.

Abstract

The nature of the S-vacancy is central to controlling the electronic properties of monolayer MoS. Understanding the geometric and electronic structures of the S-vacancy on the basal plane of monolayer MoS remains elusive. Here, S K-edge X-ray absorption spectroscopy shows the formation of clustered S-vacancies on the basal plane of monolayer MoS under reaction conditions (H atmosphere, 100-600 °C). First-principles calculations predict spectral fingerprints consistent with the experimental results. The Mo K-edge extended X-ray absorption fine structure shows the local structure as coordinatively unsaturated Mo with 4.1 ± 0.4 S atoms as nearest neighbors (above 400 °C in an H atmosphere). Conversely, the 6-fold Mo-Mo coordination in the crystal remains unchanged. Electrochemistry confirms similar active sites for hydrogen evolution. The identity of the S-vacancy defect on the basal plane of monolayer MoS is herein elucidated for applications in optoelectronics and catalysis.

摘要

S空位的性质是控制单层MoS电子性质的关键。然而,对于单层MoS基面S空位的几何和电子结构仍不清楚。本文中,S K边X射线吸收光谱表明,在反应条件(H气氛,100-600°C)下,单层MoS基面上形成了聚集的S空位。第一性原理计算预测了与实验结果一致的光谱指纹。Mo K边扩展X射线吸收精细结构表明,局部结构为配位不饱和的Mo,其最近邻有4.1±0.4个S原子(在H气氛中,400°C以上)。相反,晶体中6重Mo-Mo配位保持不变。电化学证实了析氢的类似活性位点。本文阐明了单层MoS基面上S空位缺陷的特性,以用于光电子学和催化领域。

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