Zhu Yiru, Lim Juhwan, Zhang Zhepeng, Wang Yan, Sarkar Soumya, Ramsden Hugh, Li Yang, Yan Han, Phuyal Dibya, Gauriot Nicolas, Rao Akshay, Hoye Robert L Z, Eda Goki, Chhowalla Manish
Department of Materials Science & Metallurgy, University of Cambridge, 27 Charles Babbage Road, Cambridge CB3 0FS, United Kingdom.
Cavendish Laboratory, University of Cambridge, Cambridge CB2 1TN, United Kingdom.
ACS Nano. 2023 Jul 25;17(14):13545-13553. doi: 10.1021/acsnano.3c02103. Epub 2023 Jul 7.
Atomic defects in monolayer transition metal dichalcogenides (TMDs) such as chalcogen vacancies significantly affect their properties. In this work, we provide a reproducible and facile strategy to rationally induce chalcogen vacancies in monolayer MoS by annealing at 600 °C in an argon/hydrogen (95%/5%) atmosphere. Synchrotron X-ray photoelectron spectroscopy shows that a Mo 3d core peak at 230.1 eV emerges in the annealed MoS associated with nonstoichiometric MoS (0 < < 2), and Raman spectroscopy shows an enhancement of the ∼380 cm peak that is attributed to sulfur vacancies. At sulfur vacancy densities of ∼1.8 × 10 cm, we observe a defect peak at ∼1.72 eV (referred to as LX) at room temperature in the photoluminescence (PL) spectrum. The LX peak is attributed to excitons trapped at defect-induced in-gap states and is typically observed only at low temperatures (≤77 K). Time-resolved PL measurements reveal that the lifetime of defect-mediated LX emission is longer than that of band edge excitons, both at room and low temperatures (∼2.44 ns at 8 K). The LX peak can be suppressed by annealing the defective MoS in sulfur vapor, which indicates that it is possible to passivate the vacancies. Our results provide insights into how excitonic and defect-mediated PL emissions in MoS are influenced by sulfur vacancies at room and low temperatures.
单层过渡金属二硫属化物(TMDs)中的原子缺陷,如硫族元素空位,会显著影响其性质。在本工作中,我们提供了一种可重现且简便的策略,通过在氩气/氢气(95%/5%)气氛中600°C退火,合理地在单层MoS中诱导硫族元素空位。同步辐射X射线光电子能谱表明,在与非化学计量比的MoS(0 < < 2)相关的退火MoS中出现了位于230.1 eV的Mo 3d核心峰,拉曼光谱显示归因于硫空位的380 cm峰增强。在硫空位密度约为1.8 × 10 cm时,我们在光致发光(PL)光谱中室温下观察到一个位于1.72 eV的缺陷峰(称为LX)。LX峰归因于捕获在缺陷诱导的带隙态中的激子,通常仅在低温(≤77 K)下观察到。时间分辨PL测量表明,缺陷介导的LX发射的寿命在室温和低温下都比带边激子的寿命长(8 K时约为2.44 ns)。通过在硫蒸气中对有缺陷的MoS进行退火可以抑制LX峰,这表明有可能使空位钝化。我们的结果为室温及低温下MoS中的激子和缺陷介导的PL发射如何受硫空位影响提供了见解。