Bhide Malavika A, Carmalt Claire J, Knapp Caroline E
Department of Chemistry, University College London, 20 Gordon Street, London, WC1H 0AJ, United Kingdom.
Chempluschem. 2022 Apr;87(4):e202100537. doi: 10.1002/cplu.202100537.
Highly transparent (>85 %) and conductive (1.086×10 Ω cm) zinc oxide thin films have been deposited from specifically selected precursors allowing us to establish a direct correlation between their molecular structure and the optoelectronic properties of the deposited films. Mono-ligated ethyl zinc compounds of varying steric bulk: [EtZn(OC(Me)CH(Me)N( Pr))] (1), [EtZn(OC(OEt)CH(Me)N( Pr))] (2) and [EtZn(OC(OEt)CH(CH )N(Dipp))] (3) were compared with the related bis-ligated zinc complexes [Zn(OC(Me)CH(Me)N( Pr)) ] (4), [Zn(OC(OEt)CH(Me)N( Pr)) ] (5) and [Zn(OC(OEt)CH(Me)N(Dipp)) ] (6). In all cases bulkier ligands resulted in poorer electronic properties of deposited films, whilst all mono-ligated compounds were shown as superior precursors. All complexes were characterised by H and C{ H} NMR and elemental analysis, with the structure of 6 determined by single crystal X-ray diffraction. Zinc oxide films were deposited from single and dual source (with methanol) reactions of these precursors, and analysed via XRD, XPS and EDX. Optoelectronic properties were investigated through UV/vis spectroscopy and Hall effect measurements, and morphology was examined via SEM. Tauc plots from UV/vis data indicated that Film A showed the lowest band gap of 3.31 eV. Varying the elemental composition of the precursors led to changes in the elemental composition of the resultant films, as well as changes in their structural and optoelectronic properties. Using this approach of precursor design, we have been able to tune single source precursors towards zinc oxide to deposit films with specific properties.
通过使用特定选择的前驱体沉积出了高透明度(>85%)且导电(1.086×10 Ω·cm)的氧化锌薄膜,这使我们能够在其分子结构与所沉积薄膜的光电性能之间建立直接关联。比较了具有不同空间位阻的单配体乙基锌化合物:[EtZn(OC(Me)CH(Me)N(Pr))](1)、[EtZn(OC(OEt)CH(Me)N(Pr))](2)和[EtZn(OC(OEt)CH(CH)N(Dipp))](3),以及相关的双配体锌配合物[Zn(OC(Me)CH(Me)N(Pr))](4)、[Zn(OC(OEt)CH(Me)N(Pr))](5)和[Zn(OC(OEt)CH(Me)N(Dipp))](6)。在所有情况下,空间位阻更大的配体导致所沉积薄膜的电子性能更差,而所有单配体化合物都表现为更优的前驱体。所有配合物都通过1H和13C{1H} NMR以及元素分析进行了表征,6的结构通过单晶X射线衍射确定。氧化锌薄膜通过这些前驱体的单源和双源(与甲醇)反应进行沉积,并通过XRD、XPS和EDX进行分析。通过紫外/可见光谱和霍尔效应测量研究了光电性能,并通过SEM检查了形态。紫外/可见数据的Tauc图表明薄膜A的带隙最低,为3.31 eV。改变前驱体的元素组成导致所得薄膜的元素组成发生变化,以及其结构和光电性能的变化。通过这种前驱体设计方法,我们能够将单源前驱体调整为用于氧化锌,以沉积具有特定性能的薄膜。