Liu Chen, Tseng Chia-Yun, Wang Ying-Chyi, Cheng I-Chun, Chen Jian-Zhang
Graduate Institute of Applied Mechanics, National Taiwan University, Taipei City 10617, Taiwan.
Advanced Research Center for Green Materials Science and Technology, National Taiwan University, Taipei City 10617, Taiwan.
Materials (Basel). 2022 Apr 1;15(7):2603. doi: 10.3390/ma15072603.
In this paper, low-pressure 95%Ar-5%H, pure Ar, and 95%Ar-5%O plasmas were used for post-treatment of ruthenium (Ru) deposited on nickel foam (NF) (Ru/NF). Ru/NF was then tested as a catalyst for a hydrogen evolution reaction. Significant improvement in electrocatalytic activity with the lowest overpotential and Tafel slope was observed in an alkaline electrolyte (1 M KOH) with 95%Ar-5%O plasma processing on Ru/NF. Linear scanning electrical impedance spectroscopy (EIS) and cyclic voltammetry (CV) also indicate the lowest interfacial impedance and largest electrical double layer capacitance. Experimental results with 0.1 M phosphate buffered saline (PBS) and 0.5 M HSO electrolytes were also demonstrated and compared.
在本文中，低压95%Ar-5%H、纯Ar和95%Ar-5%O等离子体用于对沉积在泡沫镍（NF）上的钌（Ru）（Ru/NF）进行后处理。然后将Ru/NF作为析氢反应的催化剂进行测试。在碱性电解质（1 M KOH）中，对Ru/NF进行95%Ar-5%O等离子体处理时，观察到电催化活性有显著提高，过电位和塔菲尔斜率最低。线性扫描电阻抗谱（EIS）和循环伏安法（CV）也表明界面阻抗最低，双电层电容最大。还展示并比较了在0.1 M磷酸盐缓冲盐水（PBS）和0.5 M HSO电解质中的实验结果。
