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二维铟和铋金属在氮化硼纳米片上的电子结构。

Electronic structure of two-dimensional In and Bi metal on BN nanosheets.

作者信息

Bo Maolin, Li Jibiao, Yao Chuang, Huang Zhongkai, Li Lei, Sun Chang Q, Peng Cheng

机构信息

Key Laboratory of Extraordinary Bond Engineering and Advanced Materials Technology (EBEAM) of Chongqing, Yangtze Normal University Chongqing 408100 China

NOVITAS, School of Electrical and Electronic Engineering, Nanyang Technological University Singapore 639798 Singapore.

出版信息

RSC Adv. 2019 Mar 22;9(17):9342-9347. doi: 10.1039/c9ra00673g.

Abstract

The electronic structures of two-dimensional (2D) indium (In) and bismuth (Bi) metal on BN nanosheets are systematically studied using hybrid density functional theory (DFT). We found that 2D In and Bi metal effectively modulate the band gap of a BN nanosheet. We also found that the indirect band gap of the 2D In and Bi metal electronic structures are 0.70 and 0.09 eV, respectively. This modulation originates from the charge transfer between the 2D metal and BN nanosheet interfaces, as well as from the electron redistribution of the In/BN and Bi/BN heterojunctions of the s and p orbitals. Our results provide an insight into 2D In/BN and Bi/BN heterojunctions, which should be useful in the design of 2D In and Bi metal-semiconductor-based devices.

摘要

利用杂化密度泛函理论(DFT)系统地研究了二维(2D)铟(In)和铋(Bi)金属在氮化硼(BN)纳米片上的电子结构。我们发现二维In和Bi金属有效地调节了BN纳米片的带隙。我们还发现二维In和Bi金属电子结构的间接带隙分别为0.70和0.09电子伏特。这种调制源于二维金属与BN纳米片界面之间的电荷转移,以及In/BN和Bi/BN异质结中s和p轨道的电子重新分布。我们的结果为二维In/BN和Bi/BN异质结提供了深入了解,这在基于二维In和Bi金属半导体的器件设计中应该是有用的。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/c12d/9062056/45eea9b3ffd4/c9ra00673g-f1.jpg

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