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基于具有特殊润湿性的SU-8光刻胶模板的用于微图案制备的毛细管液桥软光刻技术。

Capillary liquid bridge soft lithography for micro-patterning preparation based on SU-8 photoresist templates with special wettability.

作者信息

Wang Huijie, Li Xiaoxun, Luan Kang, Bai Xilin

机构信息

Multiscale Frontier Physics Research Center, School of Physics and Information Engineering, Shanxi Normal University Linfen 041004 P. R. China

Key Laboratory for Special Functional Materials of Ministry of Education, Collaborative Innovation Center of Nano Functional Materials and Applications, Henan University Kaifeng 475004 P. R. China.

出版信息

RSC Adv. 2019 Aug 2;9(41):23986-23993. doi: 10.1039/c9ra04281d. eCollection 2019 Jul 29.

Abstract

Patterned micro-nano arrays have shown great potential in the fields of optics, electronics and optoelectronics. In this study, a strategy of interface-induced dewetting assembly based on capillary liquid bridges and SU-8 photoresist templates is proposed for patterning organic molecules and nanoparticles. First, photoresist templates with chemical stability were prepared a simplified lithography method. Then the interface wettability and the contact angle hysteresis of water droplets on the fluorosilane modified templates were adequately studied and discussed. Subsequently, a sandwich structure, composed of a superhydrophilic target substrate, a hydrophobic high adhesive photoresist template and a growth solution were introduced for the confined space dewetting assembly. The related mechanism was investigated and revealed, with the assistance of observation a fluorescence microscope. Finally, the patterned arrays of water-soluble organic small molecules and aqueous dispersed nanoparticles were successfully obtained on the target substrates. This method is simple and easy, and the SU-8 photoresist templates possess a series of advantages such as low processing cost, short preparation periods and reusable performance, which endow this strategy with potential for application in molecular functional devices.

摘要

图案化的微纳阵列在光学、电子和光电子领域已展现出巨大潜力。在本研究中,提出了一种基于毛细液桥和SU-8光刻胶模板的界面诱导去湿组装策略,用于图案化有机分子和纳米颗粒。首先,采用简化光刻方法制备具有化学稳定性的光刻胶模板。然后,对氟硅烷修饰模板上水滴的界面润湿性和接触角滞后进行了充分研究和讨论。随后,引入由超亲水目标基板、疏水高粘性光刻胶模板和生长溶液组成的三明治结构用于受限空间去湿组装。借助荧光显微镜观察,对相关机理进行了研究和揭示。最后,在目标基板上成功获得了水溶性有机小分子和水性分散纳米颗粒的图案化阵列。该方法简单易行,且SU-8光刻胶模板具有加工成本低、制备周期短和可重复使用等一系列优点,这赋予了该策略在分子功能器件中的应用潜力。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/361a/9069536/e3bcb21b7811/c9ra04281d-f1.jpg

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