Faculty of Dentistry, University of Hong Kong, Hong Kong, Hong Kong.
Photobiomodul Photomed Laser Surg. 2022 Jun;40(6):378-386. doi: 10.1089/photob.2021.0184. Epub 2022 May 18.
To compare the effects of combined treatment of topical fluoride and semiconductor laser (F&L) with topically using fluoride (F) on remineralization and prevention of enamel caries. There is no agreement on whether semiconductor lasers can promote the effect of topical fluoride on the remineralization and prevention of dental caries. This study is the first systematic review and meta-analysis to investigate the pooled effect of data from studies that compared the combined use of semiconductor lasers and topical fluorides with the single use of fluoride on remineralization and prevention of caries. We performed literature search on Scopus, Web of Science, and PubMed. The keywords were as follows: ((diode lasers) OR (diode laser) OR (quantum cascade laser) OR (quantum cascade lasers) OR (Gallium Aluminum Arsenide lasers) OR (Gallium Aluminum Arsenide laser) OR (GaAlAs lasers) OR (GaAlAs Laser) OR (semiconductor laser) OR (semiconductor lasers)) AND ((caries) OR (dental caries) OR (remineralisation) OR (remineralization) OR (demineralization) OR (demineralisation)) AND fluoride. We carried out meta-analysis to compare the microhardness of demineralized enamel, lesion depth (LD), and percent reduction of calcium (Ca%) of sound enamel receiving F&L with F. The search identified nine laboratory studies, which used 445 to 980 nm semiconductor lasers with various fluorides. The standard mean difference of microhardness of demineralized enamel between F&L and F was 1.06 [95% confidence interval (CI): 0.12 to 2.00, = 0.03]. No difference was found in LD (95% CI: -1.63 to 0.10, = 0.08) and Ca% (95% CI: -0.52 to 1.28, = 0.40) on sound enamel between the two groups. Semiconductor lasers enhance the effect of fluoride on remineralizing but not on preventing enamel caries. Moreover, substantial heterogeneity was found among the studies, and the results should be interpreted cautiously.
比较氟化物和半导体激光（F&L）联合治疗与单纯使用氟化物（F）治疗在再矿化和预防釉质龋方面的效果。关于半导体激光是否能促进氟化物局部应用在再矿化和预防龋齿方面的效果，目前尚无定论。本研究是第一项系统评价和荟萃分析，旨在调查比较半导体激光和氟化物联合使用与单纯使用氟化物治疗在再矿化和预防龋齿方面的数据的综合效果。
我们在 Scopus、Web of Science 和 PubMed 上进行了文献检索。关键词如下：（（二极管激光器）或（二极管激光）或（量子级联激光器）或（量子级联激光器）或（砷化镓铝激光器）或（砷化镓铝激光）或（砷化镓铝激光器）或（砷化镓铝激光）或（半导体激光）或（半导体激光器））和（（龋齿）或（牙龋）或（再矿化）或（再矿化）或（脱矿质）或（脱矿质））和氟化物。我们进行了荟萃分析，以比较接受 F&L 和 F 治疗的脱矿釉质的显微硬度、病变深度（LD）和正常釉质的钙减少百分比（Ca%）。检索确定了九项实验室研究，这些研究使用了 445 至 980nm 的半导体激光和各种氟化物。F&L 和 F 之间脱矿釉质显微硬度的标准均数差为 1.06 [95%置信区间（CI）：0.12 至 2.00， = 0.03]。两组间 LD（95% CI：-1.63 至 0.10， = 0.08）和 Ca%（95% CI：-0.52 至 1.28， = 0.40）无差异。半导体激光增强了氟化物在再矿化方面的效果，但不能预防釉质龋。此外，研究之间存在很大的异质性，结果应谨慎解释。
