Luo Ming, Scott Douglas M, Epps Thomas H
Department of Chemical and Biomolecular Engineering and ‡Department of Materials Science and Engineering, University of Delaware, Newark, Delaware 19716, United States.
Department of Chemical and Biomolecular Engineering and Department of Materials Science and Engineering, University of Delaware, Newark, Delaware 19716, United States.
ACS Macro Lett. 2015 May 19;4(5):516-520. doi: 10.1021/acsmacrolett.5b00126. Epub 2015 Apr 20.
Block polymers (BPs) potentially can be used to template large arrays of nanopatterns for advanced nanotechnologies. However, the practical utilization of directed BP self-assembly typically requires guide patterns of relatively small size scales. In this work, the macroscopic alignment of block polymer cylinders on a template-free substrate is achieved through raster solvent vapor annealing combined with soft shear (RSVA-SS). Spatial control over nanoscale structures is realized by using a solvent vapor delivery nozzle, poly(dimethylsiloxane) shearing pad, and motorized stage. Complex patterns including dashes, crossed lines, and curves are demonstrated, along with the ability for large area alignment and scale-up for industry applications. The unique ability to directly write macroscopic patterns with microscopically aligned BP nanostructures will open new avenues of applied research in nanotechnology.
嵌段聚合物（BPs）有潜力用于为先进纳米技术制备大量纳米图案阵列。然而，定向嵌段聚合物自组装的实际应用通常需要尺寸相对较小的引导图案。在这项工作中，通过光栅溶剂蒸汽退火结合软剪切（RSVA-SS）实现了嵌段聚合物圆柱体在无模板基板上的宏观排列。通过使用溶剂蒸汽输送喷嘴、聚二甲基硅氧烷剪切垫和电动平台实现了对纳米级结构的空间控制。展示了包括虚线、交叉线和曲线在内的复杂图案，以及大面积排列和扩大规模以用于工业应用的能力。直接用微观排列的BP纳米结构书写宏观图案的独特能力将为纳米技术的应用研究开辟新途径。
