Yu Hong, Li Danting, Shang Yan, Pei Lei, Zhang Guiling, Yan Hong, Wang Long
School of Materials Science and Chemical Engineering, Harbin University of Science and Technology Harbin 150040 P. R. China
HeiLongJiang Construction Investment Group Co. Ltd No. 523, Sanda Dongli Road Harbin 150040 P. R. China.
RSC Adv. 2022 Jun 13;12(27):17422-17433. doi: 10.1039/d2ra02196j. eCollection 2022 Jun 7.
The MoS/V(Bz) and graphene/V(Bz) vdW junctions are designed and the transport properties of their four-terminal devices are comparatively investigated based on density functional theory (DFT) and the nonequilibrium Green's function (NEGF) technique. The MoS and graphene nanoribbons act as the source-to-drain channel and the spin-polarized one-dimensional (1D) benzene-V multidecker complex nanowire (V(Bz)) serves as the gate channel. Gate voltages applied on V(Bz) exert different influences of electron transport on MoS/V(Bz) and graphene/V(Bz). In MoS/V(Bz), the interplay of source and gate bias potentials could induce promising properties such as negative differential resistance (NDR) behavior, output/input current switching, and spin-polarized currents. In contrast, the gate bias plays an insignificant effect on the transport along graphene in graphene/V(Bz). This dissimilarity is attributed to the fact that the conductivity follows the sequence of MoS < V(Bz) < graphene. These transport characteristics are examined by analyzing the conductivity, the currents, the local density of states (LDOS), and the transmission spectra. These results are valuable in designing multi-terminal nanoelectronic devices.
设计了MoS/V(Bz)和石墨烯/V(Bz)范德华结,并基于密度泛函理论(DFT)和非平衡格林函数(NEGF)技术对其四端器件的输运特性进行了比较研究。MoS和石墨烯纳米带作为源漏通道,自旋极化的一维(1D)苯-V多夹层复合纳米线(V(Bz))作为栅极通道。施加在V(Bz)上的栅极电压对MoS/V(Bz)和石墨烯/V(Bz)中的电子输运有不同的影响。在MoS/V(Bz)中,源极和栅极偏置电位的相互作用可以诱导出诸如负微分电阻(NDR)行为、输出/输入电流切换和自旋极化电流等有前景的特性。相比之下,栅极偏置对石墨烯/V(Bz)中沿石墨烯的输运影响不大。这种差异归因于电导率遵循MoS < V(Bz) <石墨烯的顺序。通过分析电导率、电流、局域态密度(LDOS)和透射谱来研究这些输运特性。这些结果对于设计多端纳米电子器件具有重要价值。