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通过在硅表面设计二元、离子和电子传导缓冲界面构建富含LiF且稳定的固体电解质界面膜

Construction of a LiF-Rich and Stable SEI Film by Designing a Binary, Ion-, and Electron-Conducting Buffer Interface on the Si Surface.

作者信息

Lv Linze, Wang Yan, Huang Weibo, Li Yuchen, Shi Qiang, Zheng Honghe

机构信息

College of Energy & Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University, Suzhou, Jiangsu 215006, P.R. China.

Huaying New Energy Materials Co., Suzhou, Jiangsu 215000, P.R. China.

出版信息

ACS Appl Mater Interfaces. 2022 Aug 3;14(30):35246-35254. doi: 10.1021/acsami.2c08019. Epub 2022 Jul 23.

Abstract

Stabilizing a solid electrolyte interface (SEI) film on the Si surface is a prerequisite for realizing silicon (Si) anode applications. Interfacial engineering is one of the effective strategies to construct stable SEI films on Si surfaces and improve the electrochemical performance of the Si anodes. This work develops a silver (Ag)-decorated mucic acid (MA) buffer interface on the Si surface and the obtained Si@MA*Ag anode retains 1567 mAh g after 500 cycles at 2.1 A g and exhibits 1740 mAh g at 126 A g, which are significantly higher than those of the bare Si anode of 247 and 145 mAh g under the same conditions, respectively. Analysis indicates that the improved electrochemical performance is because of the depressed volume effect of the Si particles and the sustained integrity of the electrode laminate during cycling, the enhanced lithium diffusion on the Si surface, and the improved electronic conductivity of the Si anode, as well as the facilitated formation of inorganic components in the SEI film.

摘要

在硅表面稳定固体电解质界面(SEI)膜是实现硅(Si)负极应用的前提条件。界面工程是在硅表面构建稳定SEI膜并改善硅负极电化学性能的有效策略之一。这项工作在硅表面开发了一种银(Ag)修饰的粘酸(MA)缓冲界面,所制备的Si@MA*Ag负极在2.1 A g下循环500次后容量保持在1567 mAh g,在126 A g下容量为1740 mAh g,相比之下,相同条件下裸硅负极的容量分别仅为247和145 mAh g。分析表明,电化学性能的改善归因于硅颗粒体积效应的抑制以及循环过程中电极层压板的持续完整性、硅表面锂扩散的增强、硅负极电子导电性的提高,以及SEI膜中无机成分形成的促进。

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