Yu Sha, Tan Ling, Bai Sha, Ning Chenjun, Liu Guihao, Wang Huijuan, Liu Bin, Zhao Yufei, Song Yu-Fei
State Key Laboratory of Chemical Resource Engineering, Beijing Advanced Innovation Center for Soft Matter Science and Engineering, Beijing University of Chemical Technology, Beijing, 100029, P. R. China.
Small. 2022 Sep;18(35):e2202334. doi: 10.1002/smll.202202334. Epub 2022 Aug 7.
To realize excellent selectivity of CH in CO photoreduction (CO PR) is highly desirable, yet which is challenging due to the limited active sites for CH generation and severe electron-hole recombination on photocatalysts. Herein, based on the theoretically calculated effects of vanadium incorporation into the laminate of layered double hydroxides (LDHs), V into NiAl-LDH to synthesize a series of LDHs with various V contents is introduced. NiV-LDH is revealed to afford a high CH selectivity (78.9%), and extremely low H selectivity (only 0.4%) under λ > 400 nm irradiation. By further tuning the molar ratio of Ni to V, a CH selectivity of as high as 90.1% is achieved on Ni V-LDH, and H is completely prohibited on Ni V-LDH. Fine structural characterizations and comprehensive optical and electrochemical studies uncover V incorporation creates the lower-valence Ni species as active sites for generating CH , and enhances the generation, separation, and transfer of photogenerated carriers.
在CO光还原(CO PR)中实现对CH的优异选择性是非常可取的,但由于用于CH生成的活性位点有限以及光催化剂上严重的电子 - 空穴复合,这具有挑战性。在此,基于理论计算的钒掺入层状双氢氧化物(LDHs)层板的效应,将V引入到NiAl-LDH中以合成一系列具有不同V含量的LDHs。结果表明,在λ> 400 nm光照下,NiV-LDH具有高CH选择性(78.9%)和极低的H选择性(仅0.4%)。通过进一步调节Ni与V的摩尔比,在Ni V-LDH上实现了高达90.1%的CH选择性,并且在Ni V-LDH上完全抑制了H的生成。精细的结构表征以及全面的光学和电化学研究表明,V的掺入产生了低价态的Ni物种作为生成CH的活性位点,并增强了光生载流子的产生、分离和转移。