Faculty of Dentistry, University of Toronto, 124 Edward St, Toronto, ON, M5G1G6, Canada; Dental Health Department, College of Applied Medical Sciences, King Saud University, Riyadh, 12372, Saudi Arabia.
Faculty of Dentistry, University of Toronto, 124 Edward St, Toronto, ON, M5G1G6, Canada.
J Mech Behav Biomed Mater. 2022 Oct;134:105410. doi: 10.1016/j.jmbbm.2022.105410. Epub 2022 Aug 6.
Yttria-stabilized zirconia (Y-SZ) has become a reliable material option to restore severely compromised teeth. Y-SZ materials are prone to low-temperature degradation (LTD), which generates a tetragonal-to-monoclinic (t-m) transformed, porous layer. We suggest that room-temperature atomic layer deposition (RT-ALD) could be used for the infiltration and deposition of nanoscale SiO film over this layer, creating a protective hybrid surface against further degradation by LTD. This study investigated the potential of developing a Y-SZ transformed layer under controlled conditions for the infiltration of silica using RT-ALD, aiming to develop a hybrid zirconia-silica interface, and to investigate the effect of silica deposition/infiltration via RT-ALD on the surface roughness and wettability of zirconia-based materials. Sintered specimens (14 mm × 4 mm x 2 mm) were prepared from four different Y-SZ materials (n = 40): low translucency 3 mol % Y-SZ (3Y-LT; Ceramill ZI, Amann Girrbach); high translucency 4 mol % Y-SZ (4Y-HT; Ceramill Zolid); and two high translucency 5 mol % Y-SZ (5Y-HT - Lava Esthetic, 3M; 5Y-SHT - Ceramill Zolid, FX white). Specimens were exposed to hydrothermal treatment (HTT) to develop similar depths of crystalline changes. RT-ALD was used to deposit a thin film of silica (SiO). Surface roughness and wettability analyses were performed to investigate the effect of treatment (HTT and RT-ALD) and material on Y-SZ surface properties, and data was analyzed by two-way ANOVA and Tukey HSD (p < 0.05). RT-ALD and HTT-RT-ALD treated specimens of 3Y-LT and 5Y-HT materials were exposed to further hydrothermal aging (HA) and the surface was characterized by time-of-flight secondary ion mass spectrometry (ToF-SIMS). There was a significant interaction effect of material and treatment (HTT and RT-ALD) on roughness (p = 0.02), and surface wettability (p < 0.001). Silica deposition via RT-ALD resulted in a significant increase in surface roughness of all materials tested, while surface wettability was either improved or not changed based on the material type and HTT exposure. Nanofilms of SiO were successfully deposited on Y-SZ materials and infiltrated 3Y-LT zirconia.
氧化钇稳定氧化锆（Y-SZ）已成为修复严重受损牙齿的可靠材料选择。Y-SZ 材料容易发生低温降解（LTD），从而产生四方相到单斜相（t-m）转变，形成多孔层。我们建议在室温原子层沉积（RT-ALD）中，在该层上渗透和沉积纳米级 SiO 薄膜，以形成具有抗 LTD 进一步降解的保护性混合表面。本研究旨在开发一种在受控条件下用于 Y-SZ 转化层渗透的方法，通过 RT-ALD 来制备二氧化硅，以开发氧化锆-二氧化硅混合界面，并研究通过 RT-ALD 进行二氧化硅沉积/渗透对氧化锆基材料表面粗糙度和润湿性的影响。使用 RT-ALD 从四种不同的 Y-SZ 材料（n=40）制备烧结试样（14mm×4mm×2mm）：低透光率 3mol% Y-SZ（3Y-LT； Ceramill ZI，Amann Girrbach）；高透光率 4mol% Y-SZ（4Y-HT； Ceramill Zolid）；和两种高透光率 5mol% Y-SZ（5Y-HT-Lava Esthetic，3M；5Y-SHT-Ceramill Zolid，FX white）。通过水热处理（HTT）使试样暴露于其中，以形成类似深度的晶体变化。使用 RT-ALD 沉积二氧化硅（SiO）薄膜。通过表面粗糙度和润湿性分析来研究处理（HTT 和 RT-ALD）和材料对 Y-SZ 表面性能的影响，通过双因素方差分析和 Tukey HSD（p<0.05）对数据进行分析。对 3Y-LT 和 5Y-HT 材料的 RT-ALD 和 HTT-RT-ALD 处理的试样进行进一步水热老化（HA）处理，并用飞行时间二次离子质谱（ToF-SIMS）对表面进行了表征。材料和处理（HTT 和 RT-ALD）对粗糙度（p=0.02）和表面润湿性（p<0.001）有显著的交互作用。通过 RT-ALD 进行的二氧化硅沉积导致所有测试材料的表面粗糙度显著增加，而根据材料类型和 HTT 暴露，表面润湿性要么得到改善，要么保持不变。成功地在 Y-SZ 材料上沉积了纳米 SiO 薄膜并渗透了 3Y-LT 氧化锆。
