Sinha Ankur, Bortolotti Mauro, Ischia Gloria, Lutterotti Luca, Gialanella Stefano
Department of Industrial Engineering, University of Trento, Via Sommarive 9, Trento, 38123, Italy.
J Appl Crystallogr. 2022 Aug 1;55(Pt 4):953-965. doi: 10.1107/S1600576722006367.
Transmission electron microscopy is a powerful experimental tool, very effective for the complete characterization of nanocrystalline materials by employing a combination of imaging, spectroscopy and diffraction techniques. Electron powder diffraction (EPD) pattern fingerprinting in association with chemical information from spectroscopy can be used to deduce the identity of the crystalline phases. Furthermore, EPD has similar potential to X-ray powder diffraction (XRPD) for extracting additional information regarding material specimens, such as microstructural features and defect structures. The aim of this paper is to extend a full-pattern fitting procedure, broadly used for analysing XRPD patterns, to EPD. The interest of this approach is twofold: in the first place, the relatively short times involved with data acquisition allow one to speed up the characterization procedures. This is a particularly interesting aspect in the case of metastable structures or kinetics studies. Moreover, the reduced sampling volumes involved with electron diffraction analyses can better reveal surface alteration layers in the analysed specimen which might be completely overlooked by conventional bulk techniques. The first step forward to have an effective application of the proposed methodology concerns establishing a reliable calibration protocol to take into correct account the instrumental effects and thus separate them from those determined by the structure, microstructure and texture of the analysed samples. In this paper, the methodology for determining the instrumental broadening of the diffraction lines is demonstrated through a full quantitative analysis based on the Rietveld refinement of the EPD. In this regard, a CeO nanopowder reference specimen has been used. The results provide indications also on the specific features that a good calibration standard should have.
透射电子显微镜是一种强大的实验工具,通过结合成像、光谱和衍射技术,对纳米晶体材料进行全面表征非常有效。电子粉末衍射(EPD)图谱指纹识别与光谱化学信息相结合,可用于推断晶相的身份。此外,EPD在提取有关材料样品的额外信息方面,如微观结构特征和缺陷结构,具有与X射线粉末衍射(XRPD)类似的潜力。本文的目的是将广泛用于分析XRPD图谱的全图谱拟合程序扩展到EPD。这种方法的意义有两个方面:首先,数据采集所需的时间相对较短,这使得表征程序能够加快。在亚稳结构或动力学研究的情况下,这是一个特别有趣的方面。此外,电子衍射分析所涉及的采样体积减小,可以更好地揭示被分析样品中的表面蚀变层,而传统的体相技术可能会完全忽略这些蚀变层。有效应用所提出方法的第一步是建立一个可靠的校准协议,以正确考虑仪器效应,从而将它们与由被分析样品的结构、微观结构和织构所决定的效应区分开来。在本文中,通过基于EPD的Rietveld精修的全定量分析,展示了确定衍射线仪器展宽的方法。在这方面,使用了CeO纳米粉末参考样品。结果还提供了关于良好校准标准应具备的特定特征的指示。