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通过全氟癸酸表面改性提高荧光CsPb(Br,I)钙钛矿量子点的热稳定性

Improving the thermal resistance of fluorescent CsPb(Br,I) perovskite quantum dots by surface modification with perfluorodecanoic acid.

作者信息

Iso Yoshiki, Eri Momoko, Hiroyoshi Risako, Kano Kensho, Isobe Tetsuhiko

机构信息

Department of Applied Chemistry, Faculty of Science and Technology, Keio University, 3-14-1 Hiyoshi, Kohoku-ku, Yokohama 223-8522, Japan.

出版信息

R Soc Open Sci. 2022 Aug 24;9(8):220475. doi: 10.1098/rsos.220475. eCollection 2022 Aug.

Abstract

CsPb(Br,I) quantum dots (QDs) show application potential for optoelectronic devices. However, their thermal degradation is a significant problem. In this work, the effects of perfluorodecanoic acid (PFDA) modification on the photoluminescence (PL) and thermal resistance of CsPb(Br,I) QDs were evaluated. The PL intensity of oleic-acid-modified quantum dots (OA-QDs) in toluene decreased drastically upon heating at 100°C. The PL quantum yield of the QDs increased from 69.6% to 77.4% upon modification with PFDA. Furthermore, the PL intensity of the QDs modified with PFDA (PFDA-QDs) increased to 140.6% upon heating, because of the reduction of surface defects upon adsorption of PFDA and its optimized adsorption state. A solid-film PFDA-QDs sample heated at 80°C for 4 h showed temporary PL enhancements for the OA-QDs and PFDA-QDs films to 445% and 557% of their initial values, respectively, upon heating for 0.25 h. This was attributed to the optimized adsorption states of the surface ligands. PFDA-QDs film maintained 354% after 4 h of heating, whereas that of OA-QDs film was 104%. Thus, PFDA modification enhances PL intensity and suppresses PL degradation under heating, which is important for wavelength converters for optoelectronic device applications.

摘要

CsPb(Br,I)量子点(QDs)在光电器件方面展现出应用潜力。然而,它们的热降解是一个重大问题。在这项工作中,评估了全氟癸酸(PFDA)修饰对CsPb(Br,I)量子点的光致发光(PL)和热稳定性的影响。油酸修饰的量子点(OA-QDs)在甲苯中的PL强度在100°C加热时急剧下降。用PFDA修饰后,量子点的PL量子产率从69.6%提高到77.4%。此外,由于PFDA吸附后表面缺陷减少及其优化的吸附状态,PFDA修饰的量子点(PFDA-QDs)在加热时PL强度增加到140.6%。在80°C加热4小时的固态薄膜PFDA-QDs样品,对于OA-QDs和PFDA-QDs薄膜,在加热0.25小时后,其PL分别暂时增强到初始值的445%和557%。这归因于表面配体的优化吸附状态。加热4小时后,PFDA-QDs薄膜保持在354%,而OA-QDs薄膜为104%。因此,PFDA修饰增强了PL强度并抑制了加热下的PL降解,这对于光电器件应用的波长转换器很重要。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7d45/9399700/2fdb4e12e20a/rsos220475f01.jpg

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