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联合应用致DNA 损伤试剂和脉冲磁场诱导的基因组 DNA 损伤

Genomic DNA damage induced by co-exposure to DNA damaging agents and pulsed magnetic field.

机构信息

Departamento de Radiología y Medicina Física, Facultad de Medicina, Universidad de Málaga, Málaga, España.

出版信息

Int J Radiat Biol. 2023;99(5):853-865. doi: 10.1080/09553002.2022.2121873. Epub 2022 Sep 15.

Abstract

PURPOSE

Many articles describe the effects of extremely low-frequency magnetic fields (MFs) on DNA damage induction. However, the mechanism of MF interaction with living matter is not yet known with certainty. Some works suggest that MF could induce an increase in the efficacy of reactive oxygen species (ROS) production. This work investigates whether pulsed MF exposure produces alterations in genomic DNA damage induced by co-exposure to DNA damaging agents (bleomycin and methyl methanesulfonate (MMS)).

MATERIALS AND METHODS

Genomic DNA, prepared from cultures, was exposed to pulsed MF (1.5 mT peak, 25 Hz) and MMS (0-1%) (15-60 min), and to MF and bleomycin (0-0.6 IU/mL) (24-72 h). The damage induced to DNA was evaluated by electrophoresis and image analysis.

RESULTS

Pulsed MF induced an increment in the level of DNA damage produced by MMS and bleomycin in all groups at the exposure conditions assayed.

CONCLUSIONS

Pulsed MF could modulate the cytotoxic action of MMS and bleomycin. The observed effect could be the result of a multifactorial process influenced by the type of agent that damages DNA, the dose, and the duration of the exposure to the pulsed MF.

摘要

目的

许多文章描述了极低频磁场(MF)对 DNA 损伤诱导的影响。然而,MF 与生物物质相互作用的机制尚不能确定。一些研究表明,MF 可能会增加活性氧(ROS)产生的功效。本研究调查了脉冲 MF 暴露是否会在同时暴露于 DNA 损伤剂(博来霉素和甲基甲烷磺酸酯(MMS))时引起基因组 DNA 损伤的改变。

材料和方法

从培养物中提取基因组 DNA,使其暴露于脉冲 MF(峰值 1.5 mT,25 Hz)和 MMS(0-1%)(15-60 分钟),以及 MF 和博来霉素(0-0.6 IU/mL)(24-72 小时)。通过电泳和图像分析评估 DNA 损伤的诱导情况。

结果

在所有测试的暴露条件下,脉冲 MF 诱导了 MMS 和博来霉素引起的 DNA 损伤水平的增加。

结论

脉冲 MF 可以调节 MMS 和博来霉素的细胞毒性作用。观察到的效应可能是由多种因素共同作用的结果,这些因素受到损伤 DNA 的试剂类型、剂量和暴露于脉冲 MF 的持续时间的影响。

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