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朗道结构中纳米级场驱动畴壁振荡的直接成像

Direct imaging of nanoscale field-driven domain wall oscillations in Landau structures.

作者信息

Singh Balram, Ravishankar Rachappa, Otálora Jorge A, Soldatov Ivan, Schäfer Rudolf, Karnaushenko Daniil, Neu Volker, Schmidt Oliver G

机构信息

Institute for Integrative Nanosciences, Leibniz IFW Dresden, 01069 Dresden, Germany.

Nanophysics, Faculty of Physics, TU Dresden, 01062 Dresden, Germany.

出版信息

Nanoscale. 2022 Sep 29;14(37):13667-13678. doi: 10.1039/d2nr03351h.

DOI:10.1039/d2nr03351h
PMID:36082910
Abstract

Linear oscillatory motion of domain walls (DWs) in the kHz and MHz regime is crucial when realizing precise magnetic field sensors such as giant magnetoimpedance devices. Numerous magnetically active defects lead to pinning of the DWs during their motion, affecting the overall behavior. Thus, the direct monitoring of the domain wall's oscillatory behavior is an important step to comprehend the underlying micromagnetic processes and to improve the magnetoresistive performance of these devices. Here, we report an imaging approach to investigate such DW dynamics with nanoscale spatial resolution employing conventional table-top microscopy techniques. Time-averaged magnetic force microscopy and Kerr imaging methods are applied to quantify the DW oscillations in NiFe rectangular structures with Landau domain configuration and are complemented by numeric micromagnetic simulations. We study the oscillation amplitude as a function of external magnetic field strength, frequency, magnetic structure size, thickness and anisotropy and understand the excited DW behavior as a forced damped harmonic oscillator with restoring force being influenced by the geometry, thickness, and anisotropy of the NiFe structure. This approach offers new possibilities for the analysis of DW motion at elevated frequencies and at a spatial resolution of well below 100 nm in various branches of nanomagnetism.

摘要

当实现诸如巨磁阻抗器件等精确磁场传感器时,kHz和MHz频率范围内畴壁(DWs)的线性振荡运动至关重要。众多磁活性缺陷会导致畴壁在运动过程中被钉扎,从而影响整体行为。因此,直接监测畴壁的振荡行为是理解潜在微磁过程以及提高这些器件磁阻性能的重要一步。在此,我们报告一种成像方法,利用传统桌面显微镜技术以纳米级空间分辨率研究此类畴壁动力学。应用时间平均磁力显微镜和克尔成像方法来量化具有朗道畴结构的NiFe矩形结构中的畴壁振荡,并辅以数值微磁模拟。我们研究振荡幅度与外部磁场强度、频率、磁结构尺寸、厚度和各向异性的函数关系,并将激发的畴壁行为理解为一个受迫阻尼简谐振子,其恢复力受NiFe结构的几何形状、厚度和各向异性影响。这种方法为在纳米磁纳米磁性各分支中高频下以及远低于100 nm空间分辨率的畴壁运动分析提供了新的可能性。

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